HM

Hideaki Mitsui

HO Hoya: 22 patents #28 of 1,290Top 3%
AC Afton Chemical: 2 patents #83 of 222Top 40%
DP Dupont Photomasks: 1 patents #20 of 39Top 55%
NC Nippon Paper Industries Co.: 1 patents #263 of 535Top 50%
Overall (All Time): #162,089 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11820956 Phosphorylated dispersants in fluids for electric vehicles Tsuneo Adachi, Lesley Schmid, Christopher Cleveland, Atanu Adhvaryu 2023-11-21
11332689 Phosphorylated dispersants in fluids for electric vehicles Tsuneo Adachi, Lesley Schmid, Christopher Cleveland, Atanu Adhvaryu 2022-05-17
8609304 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device Masaru Tanabe, Naoki Nishida, Satoshi Iwashita 2013-12-17
8048594 Photomask blank, photomask, and methods of manufacturing the same Masahiro Hashimoto 2011-11-01
8021806 Photomask blank, photomask, and methods of manufacturing the same Masahiro Hashimoto 2011-09-20
8012314 Manufacturing method and apparatus of phase shift mask blank Osamu Nozawa 2011-09-06
7862963 Halftone type phase shift mask blank and phase shift mask thereof Yuuki Shiota, Osamu Nozawa 2011-01-04
7632612 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same Yuuki Shiota, Osamu Nozawa, Ryo Ohkubo 2009-12-15
7592106 Halftone type phase shift mask blank and phase shift mask thereof Yuuki Shiota, Osamu Nozawa 2009-09-22
7402228 Manufacturing method and apparatus of phase shift mask blank Osamu Nozawa 2008-07-22
7282121 Manufacturing method and apparatus of phase shift mask blank Osamu Nozawa 2007-10-16
7169513 Halftone type phase shift mask blank and phase shift mask thereof Yuuki Shiota, Osamu Nozawa 2007-01-30
7115341 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same Yuuki Shiota, Osamu Nozawa, Ryo Ohkubo 2006-10-03
7060394 Halftone phase-shift mask blank and halftone phase-shift mask Yuki Shiota, Osamu Nozawa 2006-06-13
7011910 Halftone-type phase-shift mask blank, and halftone-type phase-shift mask Yuki Shiota, Osamu Nozawa, Ryo Ohkubo 2006-03-14
6844119 Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask Osamu Nozawa, Laurent Dieu 2005-01-18
6783634 Manufacturing method and apparatus of phase shift mask blank Osamu Nozawa 2004-08-31
6762000 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks Osamu Nozawa, Masaru Mitsui, Hitoshi Ootsuka 2004-07-13
6723477 Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask Osamu Nozawa, Masaru Mitsui 2004-04-20
6677087 Phase shift mask blank, phase shift mask, and method for manufacturing the same Osamu Nozawa 2004-01-13
6462130 Polyamide-modified polyolefinic composition and uses thereof Kenichi Fujino, Kazuhiro Usui, Terumasa Fujitaka, Hidetoshi Yoshioka 2002-10-08
6395434 Phase shift mask and phase shift mask blank Osamu Nozawa, Megumi Takeuchi 2002-05-28
6335124 Phase shift mask and phase shift mask blank Osamu Nozawa, Megumi Takeuchi 2002-01-01
6087047 Phase shift mask and phase shift mask blank Osamu Nozawa, Megumi Takeuchi 2000-07-11
5955223 Phase-shift mask blank and process for the production thereof comprising a semi transparent film with silicon and nitrogen Kenji Matsumoto, Yoichi Yamaguchi 1999-09-21