| 8652306 |
Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blank |
— |
2014-02-18 |
| 8039178 |
Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks |
Masaru Tanabe |
2011-10-18 |
| 7862960 |
Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks |
Masaru Tanabe |
2011-01-04 |
| 7833387 |
Mask blank manufacturing method and sputtering target for manufacturing the same |
Toshiyuki Suzuki |
2010-11-16 |
| 7635950 |
Short-arc type high pressure discharge lamp having gaps formed among electrode axes, metal foils and a glass material surface |
Kiyotaka Tanba, Takayuki Kagami, Nobuo Kanai, Yasuhito Sakai |
2009-12-22 |
| 7601468 |
Process for manufacturing half-tone phase shifting mask blanks |
Toshiyuki Suzuki, Shigenori Ishihara |
2009-10-13 |
| D568839 |
Photomask blank |
Shigekazu Matsui, Masao Ushida, Osamu Nagarekawa |
2008-05-13 |
| D543160 |
Photomask blank |
Shigekazu Matsui, Masao Ushida, Osamu Nagarekawa |
2007-05-22 |
| 7217481 |
Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern |
Haruhiko Yamagata, Masao Ushida |
2007-05-15 |
| D537048 |
Photomask blank |
— |
2007-02-20 |
| 7141339 |
Process for manufacturing half-tone phase shifting mask blanks |
Toshiyuki Suzuki, Shigenori Ishihara |
2006-11-28 |
| 7026077 |
Photomask blank manufacturing method |
Toshiyuki Suzuki, Shigenori Ishihara |
2006-04-11 |
| 6899979 |
Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
Haruhiko Yamagata, Masao Ushida |
2005-05-31 |
| 6762000 |
Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks |
Osamu Nozawa, Hitoshi Ootsuka, Hideaki Mitsui |
2004-07-13 |
| 6723477 |
Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask |
Osamu Nozawa, Hideaki Mitsui |
2004-04-20 |
| 6475681 |
Phase shift mask and phase shift mask blank |
Kimihiro Okada, Hideki Suda |
2002-11-05 |
| 6242138 |
Phase shift mask and phase shift mask blank |
Kimihiro Okada, Hideki Suda |
2001-06-05 |
| 6153341 |
Phase shift mask and phase shift mask blank |
Kimihiro Okada, Hideki Suda |
2000-11-28 |
| 6037083 |
Halftone phase shift mask blanks, halftone phase shift masks, and fine pattern forming method |
— |
2000-03-14 |
| 5942356 |
Phase shift mask and phase shift mask blank |
Kimihiro Okada, Hideki Suda |
1999-08-24 |
| 5858582 |
Phase shift mask and phase shift mask blank |
— |
1999-01-12 |
| 5849439 |
Method for preparing phase shift mask blank, and phase mask |
— |
1998-12-15 |
| 5804337 |
Phase shift mask and phase shift mask blank |
— |
1998-09-08 |
| 5635315 |
Phase shift mask and phase shift mask blank |
— |
1997-06-03 |