RK

Ryeun Kwan Kim

Applied Materials: 5 patents #2,165 of 7,310Top 30%
Overall (All Time): #955,972 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11365476 Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices Praket P. Jha, Allen Ko, Xinhai Han, Thomas Jongwan Kwon, Bok Hoen Kim +2 more 2022-06-21
10483282 VNAND tensile thick TEOS oxide Michael Wenyoung Tsiang, Praket P. Jha, Xinhai Han, Bok Hoen Kim, Sang Hyuk Kim +8 more 2019-11-19
10246772 Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices Praket P. Jha, Allen Ko, Xinhai Han, Thomas Jongwan Kwon, Bok Hoen Kim +2 more 2019-04-02
10199388 VNAND tensile thick TEOS oxide Michael Wenyoung Tsiang, Praket P. Jha, Xinhai Han, Bok Hoen Kim, Sang Hyuk Kim +8 more 2019-02-05
7824743 Deposition processes for titanium nitride barrier and aluminum Wei Ti Lee, Yen-Chih Wang, Mohd Fadzli Anwar Hassan, Hyung Chul Park, Ted Guo +1 more 2010-11-02