Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10651286 | High selectivity nitride removal process based on selective polymer deposition | Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise | 2020-05-12 |
| 10325998 | High selectivity nitride removal process based on selective polymer deposition | Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise | 2019-06-18 |
| 10269924 | High selectivity nitride removal process based on selective polymer deposition | Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise | 2019-04-23 |
| 9627533 | High selectivity nitride removal process based on selective polymer deposition | Sebastian U. Engelmann, Nicholas C. M. Fuller, Masahiro Nakamura, Richard S. Wise | 2017-04-18 |
| 9240482 | Asymmetric stressor DRAM | Shreesh Narasimha, Ahmed Nayaz Noemaun, Karen A. Nummy, Katsunori Onishi, Paul C. Parries +3 more | 2016-01-19 |