NM

Nobuya Miyoshi

HH Hitachi High-Technologies: 13 patents #533 of 1,917Top 30%
Overall (All Time): #367,740 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
12051574 Wafer processing method and plasma processing apparatus Hiroyuki Kobayashi, Atsushi Sekiguchi, Tatehito Usui, Soichiro Eto, Shigeru Nakamoto +1 more 2024-07-30
11915951 Plasma processing method Hiroyuki Kobayashi, Kazunori Shinoda, Tatehito Usui, Naoyuki Kofuji, Yutaka Kouzuma +4 more 2024-02-27
11557463 Vacuum processing apparatus Hiroyuki Kobayashi, Kazunori Shinoda, Kenji Maeda, Yutaka Kouzuma, Satoshi Sakai +1 more 2023-01-17
11276579 Substrate processing method and plasma processing apparatus Hiroyuki Kobayashi, Kazunori Shinoda, Yutaka Kouzuma, Masaru Izawa 2022-03-15
10937635 Vacuum processing apparatus Hiroyuki Kobayashi, Kazunori Shinoda, Kenji Maeda, Yutaka Kouzuma, Satoshi Sakai +1 more 2021-03-02
10872779 Plasma etching method and plasma etching apparatus Hiroyuki Kobayashi, Kazunori Shinoda, Kohei Kawamura, Kazumasa Ookuma, Yutaka Kouzuma +1 more 2020-12-22
D901407 Integrated type ion shield for semiconductor manufacturing apparatus Yutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Kohei Kawamura, Hiroyuki Kobayashi 2020-11-10
D900760 Ion shield plate for semiconductor manufacturing apparatus Yutaka Kouzuma, Michiaki Kobayashi, Kazuyuki Hirozane, Kohei Kawamura, Hiroyuki Kobayashi 2020-11-03
10418254 Etching method and etching apparatus Kazunori Shinoda, Naoyuki Kofuji, Hiroyuki Kobayashi, Kohei Kawamura, Masaru Izawa +2 more 2019-09-17
10325781 Etching method and etching apparatus Kazunori Shinoda, Satoshi Sakai, Masaru Izawa, Hiroyuki Kobayashi, Yutaka Kouzuma +2 more 2019-06-18
10290472 Vacuum processing apparatus Hiroyuki Kobayashi, Kazunori Shinoda, Kenji Maeda, Yutaka Kouzuma, Satoshi Sakai +1 more 2019-05-14
10192720 Plasma processing apparatus Hiroyuki Kobayashi, Kazunori Shinoda, Kenji Maeda, Satoshi Sakai, Masaru Izawa 2019-01-29
10141207 Operation method of plasma processing apparatus Yutaka Kouzuma, Hiroyuki Kobayashi, Kenetsu Yokogawa, Tomoyuki Watanabe 2018-11-27