Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7038228 | Image forming apparatus with specific document determining module and abnormality detection means | Yutaka Hasegawa, Takeshi Ukai, Hideaki Yamagata, Kazuhisa Ohtsubo | 2006-05-02 |
| 6949757 | Specific document determining apparatus including a microwave sensor | Yutaka Hasegawa, Takeshi Ukai, Hideaki Yamagata, Kazuhisa Ohtsubo | 2005-09-27 |
| 6696696 | Image forming apparatus with specific document module having a microwave sensor | Yutaka Hasegawa, Takeshi Ukai, Hideaki Yamagata, Kazuhisa Ohtsubo | 2004-02-24 |
| 6025603 | Specific document determining apparatus, image reading apparatus, specific document determining method, and a computer-readable recording medium with a program for execution of the method stored therein image reading apparatus having a specific document | Yutaka Hasegawa, Takeshi Ukai, Hideaki Yamagata, Kazuhisa Ohtsubo | 2000-02-15 |
| 5518937 | Semiconductor device having a region doped to a level exceeding the solubility limit | Yuji Furumura, Fumitake Mieno, Tsutomu Nakazawa, Takashi Eshita, Tsunenori Yamauchi | 1996-05-21 |
| 5270224 | Method of manufacturing a semiconductor device having a region doped to a level exceeding the solubility limit | Yuji Furumura, Fumitake Mieno, Tsutomu Nakazawa, Takashi Eshita, Tsunenori Yamauchi | 1993-12-14 |
| 5148259 | Semiconductor device having thin film wiring layer of aluminum containing carbon | Takashi Kato, Takashi Ito | 1992-09-15 |
| 5111266 | Semiconductor device having a region doped to a level exceeding the solubility limit | Yuji Furumura, Fumitake Mieno, Tsutomu Nakazawa, Takashi Eshita, Tsunenori Yamauchi | 1992-05-05 |
| 4804560 | Method of selectively depositing tungsten upon a semiconductor substrate | Yoshimi Shioya, Yasushi Oyama, Norihisa Tsuzuki, Masaaki Ichikawa, Fumitake Mieno +6 more | 1989-02-14 |
| 4625678 | Apparatus for plasma chemical vapor deposition | Yoshimi Shioya, Yasushi Ohyama, Mikio Takagi | 1986-12-02 |
| 4513026 | Method for coating a semiconductor device with a phosphosilicate glass | Hidekazu Miyamoto, Yoshimi Shioya, Mikio Takagi | 1985-04-23 |
| 4394401 | Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film | Yoshimi Shioya, Kanetake Takasaki, Mikio Takagi | 1983-07-19 |
| 4366506 | Picture transfer method and apparatus therefor | Koichi Ejiri, Morisumi Kurose | 1982-12-28 |
| 4363868 | Process of producing semiconductor devices by forming a silicon oxynitride layer by a plasma CVD technique which is employed in a selective oxidation process | Kanetake Takasaki | 1982-12-14 |
| 4293590 | Process for high pressure oxidation of silicon | Mikio Takagi, Hajime Kamioka | 1981-10-06 |
| 4293589 | Process for high pressure oxidation of silicon | Mikio Takagi, Hajime Kamioka | 1981-10-06 |
| 4275094 | Process for high pressure oxidation of silicon | Mikio Takagi, Hajime Kamioka | 1981-06-23 |
| 4271436 | Digital copying machine | Morio Kurose, Koichi Ejiri | 1981-06-02 |
| 4263087 | Process for producing epitaxial layers | Kaoru Tanabe, Yoshifumi Nomura, Mikio Takagi | 1981-04-21 |