YS

Yoshimi Shioya

SC Semiconductor Process Laboratory Co.: 17 patents #3 of 32Top 10%
Canon: 14 patents #4,747 of 19,416Top 25%
Fujitsu Limited: 7 patents #4,529 of 24,456Top 20%
Overall (All Time): #175,525 of 4,157,543Top 5%
24
Patents All Time

Issued Patents All Time

Showing 1–24 of 24 patents

Patent #TitleCo-InventorsDate
7329612 Semiconductor device and process for producing the same Yuhko Nishimoto, Kazuo Maeda 2008-02-12
7238629 Deposition method, method of manufacturing semiconductor device, and semiconductor device Kazuo Maeda 2007-07-03
7132171 Low dielectric constant insulating film and method of forming the same Toshiyuki Ohdaira 2006-11-07
6911405 Semiconductor device and method of manufacturing the same Kouichi Ohira, Kazuo Maeda, Tomomi Suzuki, Youichi Yamamoto, Yuichiro Kotake +2 more 2005-06-28
6852651 Semiconductor device and method of manufacturing the same Yuichiro Kotake, Tomomi Suzuki, Hiroshi Ikakura, Kazuo Maeda 2005-02-08
6815824 Semiconductor device and method of manufacturing the same Yuhko Nishimoto, Kazuo Maeda, Tomomi Suzuki, Hiroshi Ikakura 2004-11-09
6780790 Semiconductor device and method of manufacturing the same Yuhko Nishimoto, Tomomi Suzuki, Kazuo Maeda 2004-08-24
6713383 Semiconductor device manufacturing method Yuhko Nishimoto, Tomomi Suzuki, Shoji Ohgawara, Kazuo Maeda 2004-03-30
6673725 Semiconductor device and method of manufacturing the same Kouichi Ohira, Kazuo Maeda 2004-01-06
6649495 Manufacturing method of semiconductor device Yuhko Nishimoto, Tomomi Suzuki, Hiroshi Ikakura, Kazuo Maeda 2003-11-18
6645883 Film forming method, semiconductor device and manufacturing method of the same Youichi Yamamoto, Hiroshi Ikakura, Tomomi Suzuki, Yuichiro Kotake, Kouichi Ohira +2 more 2003-11-11
6642157 Film forming method and semiconductor device Yuichiro Kotake, Youichi Yamamoto, Tomomi Suzuki, Hiroshi Ikakura, Shoji Ohgawara +2 more 2003-11-04
6630412 Semiconductor device and method of manufacturing the same Kouichi Ohira, Kazuo Maeda, Tomomi Suzuki, Hiroshi Ikakura, Youichi Yamamoto 2003-10-07
6514855 Semiconductor device manufacturing method having a porous insulating film Tomomi Suzuki, Hiroshi Ikakura, Kazuo Maeda, Koichi Ohira 2003-02-04
6479408 Semiconductor device and method of manufacturing the same Kouichi Ohira, Kazuo Maeda 2002-11-12
6479409 Fabrication of a semiconductor device with an interlayer insulating film formed from a plasma devoid of an oxidizing agent Kouichi Ohira, Kazuo Maeda, Tomomi Suzuki, Hiroshi Ikakura, Youichi Yamamoto +3 more 2002-11-12
6472334 Film forming method, semiconductor device manufacturing method, and semiconductor device Hiroshi Ikakura, Tomomi Suzuki, Kazuo Maeda, Kouichi Ohira 2002-10-29
4906593 Method of producing a contact plug Yuji Furumura, Yasushi Ohyama, Shin-ichi Inoue, Tsutomu Ogawa, Kiyoshi Watanabe +1 more 1990-03-06
4804560 Method of selectively depositing tungsten upon a semiconductor substrate Yasushi Oyama, Norihisa Tsuzuki, Mamoru Maeda, Masaaki Ichikawa, Fumitake Mieno +6 more 1989-02-14
4625678 Apparatus for plasma chemical vapor deposition Mamoru Maeda, Yasushi Ohyama, Mikio Takagi 1986-12-02
4513026 Method for coating a semiconductor device with a phosphosilicate glass Hidekazu Miyamoto, Mamoru Maeda, Mikio Takagi 1985-04-23
4487787 Method of growing silicate glass layers employing chemical vapor deposition process Mikio Takagi 1984-12-11
4406053 Process for manufacturing a semiconductor device having a non-porous passivation layer Kanetake Takasaki 1983-09-27
4394401 Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film Mamoru Maeda, Kanetake Takasaki, Mikio Takagi 1983-07-19