Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10472718 | Temperature-controlled gas supply line with dilution gas flows supplied at multiple locations | Markus Gersdorff, Baskar Pagadala Gopi, Michael D. Long | 2019-11-12 |
| 10221482 | Gas distributor for a CVD reactor | Thomas Krücken, Baskar Pagadala Gopi | 2019-03-05 |
| 9587312 | Gas inlet member of a CVD reactor | Hugo Silva, Nico Jouault, Victor Saywell, Fred Michael Andrew CRAWLEY, Johannes Lindner | 2017-03-07 |
| 8157915 | CVD reactor having a process-chamber ceiling which can be lowered | Johannes Käppeler, Bernd Schulte | 2012-04-17 |
| 8152924 | CVD reactor comprising a gas inlet member | Johannes Käppeler, Conor Nicholas Martin | 2012-04-10 |
| 7625448 | Inlet system for an MOCVD reactor | Martin Conor, Gerhard Karl Strauch, Johannes Kaeppeler | 2009-12-01 |
| 7294207 | Gas-admission element for CVD processes, and device | Gerd Strauch, Johannes Kaeppeler | 2007-11-13 |
| 6972050 | Method for depositing in particular crystalline layers, and device for carrying out the method | Michael D. Bremser, Gerhard Karl Strauch | 2005-12-06 |
| 6932866 | Method for depositing in particular crystalline layers | — | 2005-08-23 |
| 6849241 | Device and method for depositing one or more layers on a substrate | Marcus Schumacher, Holger Juergensen, Gerd Strauch, Piotr Strzyzewski | 2005-02-01 |