Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8815746 | Apparatus and method for producing microcomponents and use of | — | 2014-08-26 |
| 7665416 | Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles | Alexander Gschwandtner, Alexander Mattheus, Stephan Schneider, Jürgen Sellmaier, Heinz Steinhardt | 2010-02-23 |
| 7071110 | Process for the plasma etching of materials not containing silicon | Günther Ruhl | 2006-07-04 |
| 7063921 | Photomask, in particular alternating phase shift mask, with compensation structure | Wolfgang Dettman, Oliver Fagerer, Bettina Schiessl, Stephen Rahn | 2006-06-20 |
| 6919147 | Production method for a halftone phase mask | Günther Ruhl | 2005-07-19 |
| 6706141 | Device to generate excited/ionized particles in a plasma | Heinz Steinhardt, Alexander Gschwandtner | 2004-03-16 |
| 6569772 | Method for producing an alternating phase mask | Jurgen Knobloch, Christoph Nolscher | 2003-05-27 |
| 6152073 | Assembly for the manufacture of highly integrated circuits on a semiconductor substrate | — | 2000-11-28 |
| 6013136 | Apparatus for plasma-supported back etching of a semiconductor wafer | — | 2000-01-11 |
| 5945351 | Method for etching damaged zones on an edge of a semiconductor substrate, and etching system | — | 1999-08-31 |
| 5874366 | Method for etching a semiconductor substrate and etching system | Roland Sporer, Alexander Gschwandtner | 1999-02-23 |
| 5693182 | Method for damage etching the back side of a semiconductor disk having a protected front side | — | 1997-12-02 |
| 5489362 | Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy | Heinz Steinhardt | 1996-02-06 |
| 5073515 | Method for manufacturing a trench capacitor of a one-transistor memory cell in a semiconductor substrate with a self-aligned capacitor plate electrode | Siegfried Roehl | 1991-12-17 |
| 4390394 | Method of structuring with metal oxide masks by reactive ion-beam etching | Karin Unger | 1983-06-28 |