Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163667 | Linear wafer drive for handling wafers during semiconductor fabrication | Jed Keller, Laurence Dulmage, David V. Adams, Eric Winger, Lawrence A. Wise | 2018-12-25 |
| 4966869 | Tungsten disilicide CVD | Joseph T. Hillman, William M. Triggs | 1990-10-30 |
| 4870245 | Plasma enhanced thermal treatment apparatus | Edwin E. Reed, James L. Rutledge | 1989-09-26 |
| 4861563 | Vacuum load lock | Brian Shekerjian | 1989-08-29 |
| 4788416 | Direct wafer temperature control | Richard S. Rosler | 1988-11-29 |
| 4777061 | Blanket tungsten deposition for dielectric | Schyi-yi Wu, John Mendonca, Yu C. Chow | 1988-10-11 |
| 4749597 | Process for CVD of tungsten | John Mendonca, Richard S. Rosler | 1988-06-07 |
| 4737474 | Silicide to silicon bonding process | Yu C. Chow, John Mendonca, Schyi-yi Wu | 1988-04-12 |
| 4692343 | Plasma enhanced CVD | Schyi-yi Wu | 1987-09-08 |
| 4640224 | CVD heat source | Matthew L. Bunch, Robert W. Stitz | 1987-02-03 |
| 4632056 | CVD temperature control | Robert W. Stitz | 1986-12-30 |
| 4632057 | CVD plasma reactor | Matthew L. Bunch, Robert W. Stitz | 1986-12-30 |
| 4605947 | Titanium nitride MOS device gate electrode and method of producing | Philip J. Tobin, Fabio Pintchovski, Christian A. Seelbach | 1986-08-12 |
| 4570328 | Method of producing titanium nitride MOS device gate electrode | Philip J. Tobin, Fabio Pintchovski, Christian A. Seelbach | 1986-02-18 |