| 12274051 |
Metal gate memory device and method |
Jongpyo Kim, Byung Yoon Kim |
2025-04-08 |
| 9356147 |
FinFET spacer etch for eSiGe improvement |
Hong Yu, Puneet Khanna |
2016-05-31 |
| 9324841 |
Methods for preventing oxidation damage during FinFET fabrication |
Hong Yu, Huang Liu, Richard J. Carter |
2016-04-26 |
| 9236312 |
Preventing EPI damage for cap nitride strip scheme in a Fin-shaped field effect transistor (FinFET) device |
Hong Yu, Richard J. Carter |
2016-01-12 |
| 9024368 |
Fin-type transistor structures with extended embedded stress elements and fabrication methods |
Hong Yu, Bingwu Liu, Puneet Khanna, Lun Zhao |
2015-05-05 |
| 8891316 |
Nonvolatile memory devices including notched word lines |
Boyoung Seo, Yongkyu Lee, Yongtae Kim, Byungsup Shim |
2014-11-18 |
