Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7786005 | Method for manufacturing semiconductor device to form a via hole | Kenichi Yamamoto, Masashige Moritoki, Takashi Shimane, Kazumi Saito, Takamasa Itou +2 more | 2010-08-31 |
| 7718532 | Method of forming a high-k film on a semiconductor device | Hidemitsu Aoki, Toshiyuki Iwamoto | 2010-05-18 |
| 7592266 | Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device | Hidemitsu Aoki | 2009-09-22 |
| 7560372 | Process for making a semiconductor device having a roughened surface | Hidemitsu Aoki, Kaoru Mikagi, Akira Furuya, Tetsuya Tao | 2009-07-14 |
| 7312186 | Cleaning solution for semiconductor substrate | Masayuki Takashima, Yoshiko Kasama, Hidemitsu Aoki | 2007-12-25 |
| 7312160 | Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device | Hidemitsu Aoki | 2007-12-25 |
| 7268087 | Manufacturing method of semiconductor device | Hidemitsu Aoki, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni | 2007-09-11 |
| 7192835 | Method of forming a high-k film on a semiconductor device | Hidemitsu Aoki, Toshiyuki Iwamoto | 2007-03-20 |
| 7186354 | Anticorrosive treating concentrate | Hidemitsu Aoki, Masayuki Takashima | 2007-03-06 |
| 7170172 | Semiconductor device having a roughened surface | Hidemitsu Aoki, Kaoru Mikagi, Akira Furuya, Tetsuya Tao | 2007-01-30 |
| 7138362 | Washing liquid composition for semiconductor substrate | Yumiko Abe, Norio Ishikawa, Hidemitsu Aoki, Yoshiko Kasama | 2006-11-21 |
| 7087562 | Post-CMP washing liquid composition | Yumiko Abe, Takuo Oowada, Norio Ishikawa, Hidemitsu Aoki | 2006-08-08 |
| 6998352 | Cleaning method, method for fabricating semiconductor device and cleaning solution | Hidemitsu Aoki, Kenichi Yamamoto | 2006-02-14 |
| 6992050 | Stripping agent composition and method of stripping | Tatsuya Koita, Keiji Hirano, Hidemitsu Aoki | 2006-01-31 |
| 6897150 | Semiconductor wafer surface and method of treating a semiconductor wafer surface | Hidemitsu Aoki | 2005-05-24 |
| 6890864 | Semiconductor device fabricating method and treating liquid | Hidemitsu Aoki, Kenichi Nakabeppu, Toshiyuki Takewaki, Nobuo Hironaga, Hiroyuki Kunishima | 2005-05-10 |
| 6864187 | Method of washing a semiconductor wafer | Hidemitsu Aoki | 2005-03-08 |
| 6797648 | Cleaning water for cleaning a wafer and method of cleaning a wafer | Hidemitsu Aoki | 2004-09-28 |
| 6787480 | Manufacturing method of semicondcutor device | Hidemitsu Aoki, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni | 2004-09-07 |
| 6592677 | Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions | Hidemitsu Aoki | 2003-07-15 |