| 9188848 |
Maskless vortex phase shift optical direct write lithography |
Nicholas K. Eib, Neal Callan |
2015-11-17 |
| 8377633 |
Maskless vortex phase shift optical direct write lithography |
Nicholas K. Eib, Neal Callan |
2013-02-19 |
| 8057963 |
Maskless vortex phase shift optical direct write lithography |
Nicholas K. Eib, Neal Callan |
2011-11-15 |
| 7738078 |
Optimized mirror design for optical direct write |
Nicholas K. Eib, Neal Callan |
2010-06-15 |
| 7494752 |
Method and systems for utilizing simplified resist process models to perform optical and process corrections |
— |
2009-02-24 |
| 7458060 |
Yield-limiting design-rules-compliant pattern library generation and layout inspection |
Nicolas K. Eib |
2008-11-25 |
| 7372547 |
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography |
Nicholas K. Eib, Neal Callan |
2008-05-13 |
| 7325222 |
Method and apparatus for verifying the post-optical proximity corrected mask wafer image sensitivity to reticle manufacturing errors |
Nadya Strelkova, John V. Jensen |
2008-01-29 |
| 7313508 |
Process window compliant corrections of design layout |
Colin D. Yates, Nicholas K. Eib, Christopher Neville, Mario Garza, Neal Callan |
2007-12-25 |
| 7270942 |
Optimized mirror design for optical direct write |
Nicholas K. Eib, Neal Callan |
2007-09-18 |
| 7264906 |
OPC based illumination optimization with mask error constraints |
Nicholas K. Eib, Mario Garza, Paul G. Filseth, Lav D. Ivanovic |
2007-09-04 |
| 7189498 |
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process |
Nicholas K. Eib, Neal Callan |
2007-03-13 |
| 7117475 |
Method and system for utilizing an isofocal contour to perform optical and process corrections |
— |
2006-10-03 |
| 7001695 |
Multiple alternating phase shift technology for amplifying resolution |
Christopher Neville |
2006-02-21 |
