| 5096856 |
In-situ doped silicon using tertiary butyl phosphine |
— |
1992-03-17 |
| 5023206 |
Semiconductor device with adjacent non-oxide layers and the fabrication thereof |
— |
1991-06-11 |
| 4988533 |
Method for deposition of silicon oxide on a wafer |
Joseph D. Luttmer, Patricia B. Smith, Cecil J. Davis |
1991-01-29 |
| 4916091 |
Plasma and plasma UV deposition of SiO.sub.2 |
James B. Burris, Cecil J. Davis, Lee M. Loewenstein |
1990-04-10 |
| 4911103 |
Processing apparatus and method |
Cecil J. Davis, Robert T. Matthews, Joel T. Tomlin, Rhett B. Jucha |
1990-03-27 |
| 4910043 |
Processing apparatus and method |
James B. Burris, Cecil J. Davis, Lee M. Lowenstein |
1990-03-20 |
| 4906328 |
Method for wafer treating |
James B. Burris, Cecil J. Davis, Lee M. Loewenstein |
1990-03-06 |
| 4882299 |
Deposition of polysilicon using a remote plasma and in situ generation of UV light. |
James B. Burris |
1989-11-21 |
| 4877753 |
In situ doped polysilicon using tertiary butyl phosphine |
— |
1989-10-31 |
| 4863561 |
Method and apparatus for cleaning integrated circuit wafers |
Cecil J. Davis |
1989-09-05 |
| 4832778 |
Processing apparatus for wafers |
Cecil J. Davis, Robert T. Matthews, Joel T. Tomlin |
1989-05-23 |
| 4822450 |
Processing apparatus and method |
Cecil J. Davis, Lee M. Loewenstein, Rhett B. Jucha, Robert T. Matthews, Randall C. Hildenbrand +1 more |
1989-04-18 |
| 4810673 |
Oxide deposition method |
— |
1989-03-07 |