Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6499007 | Parameter editing method and semiconductor exposure system | Yoichi Kuroki, Hiroki Suzukawa, Kenichi Kawai, Takahiro Senda | 2002-12-24 |
| 5365342 | Alignment and exposure apparatus and method for manufacture of integrated circuits | Naoki Ayata, Mitsugu Yamamura, Masao Kosugi, Kazuo Takahashi, Mitsuaki Seki | 1994-11-15 |
| 5197118 | Control system for a fine pattern printing apparatus | Ryuichi Sato, Masanori Numata, Naoki Ayata | 1993-03-23 |
| 5050111 | Alignment and exposure apparatus and method for manufacture of integrated circuits | Naoki Ayata, Mitsugu Yamamura, Masao Kosugi, Kazuo Takahashi, Mitsuaki Seki | 1991-09-17 |
| 4937618 | Alignment and exposure apparatus and method for manufacture of integrated circuits | Naoki Ayata, Mitsugu Yamamura, Masao Kosugi, Kazuo Takahashi, Mitsuaki Seki | 1990-06-26 |
| 4918320 | Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment | Hajime Igarashi, Akiya Nakai, Naoki Ayata | 1990-04-17 |
| 4881100 | Alignment method | Akiya Nakai, Shinji Utamura | 1989-11-14 |
| 4811059 | Alignment method | Shinji Utamura, Akiya Nakai | 1989-03-07 |
| 4801808 | Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system | — | 1989-01-31 |
| 4677474 | Wafer prober | Mitsuya Sato | 1987-06-30 |