Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7045259 | Post exposure modification of critical dimensions in mask fabrication | Takeshi Ohfuji, Hiroyuki Inomata, Shiho Sasaki | 2006-05-16 |
| 7045260 | Post exposure modification of critical dimensions in mask fabrication | Takeshi Ohfuji, Hiroyuki Inomata, Shiho Sasaki | 2006-05-16 |
| 6801295 | Post exposure modification of critical dimensions in mask fabrication | Hiroyuki Inomata, Osamu Katada, Takeshi Ohfuji, Shiho Sasaki, Michiro Takano | 2004-10-05 |
| 5688617 | Phase shift layer-containing photomask, and its production and correction | Koichi Mikami, Hiroyuki Miyashita, Yoichi Takahashi, Hiroshi Fujita | 1997-11-18 |
| 5614336 | Phase shift layer-containing photomask, and its production and correction | Koichi Mikami, Hiroyuki Miyashita, Yoichi Takahashi, Hiroshi Fujita | 1997-03-25 |