Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8124301 | Gradated photomask and its fabrication process | Junji Fujikawa, Shu Shimada, Yuuichi Yoshida, Tsuyoshi Amano, Kimio Ito +2 more | 2012-02-28 |
| 7045259 | Post exposure modification of critical dimensions in mask fabrication | Takeshi Ohfuji, Hiroyuki Inomata, Masa-aki Kurihara | 2006-05-16 |
| 7045260 | Post exposure modification of critical dimensions in mask fabrication | Takeshi Ohfuji, Hiroyuki Inomata, Masa-aki Kurihara | 2006-05-16 |
| 6801295 | Post exposure modification of critical dimensions in mask fabrication | Hiroyuki Inomata, Osamu Katada, Masa-aki Kurihara, Takeshi Ohfuji, Michiro Takano | 2004-10-05 |