Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7045260 | Post exposure modification of critical dimensions in mask fabrication | Hiroyuki Inomata, Shiho Sasaki, Masa-aki Kurihara | 2006-05-16 |
| 7045259 | Post exposure modification of critical dimensions in mask fabrication | Hiroyuki Inomata, Shiho Sasaki, Masa-aki Kurihara | 2006-05-16 |
| 6801295 | Post exposure modification of critical dimensions in mask fabrication | Hiroyuki Inomata, Osamu Katada, Masa-aki Kurihara, Shiho Sasaki, Michiro Takano | 2004-10-05 |
| 5994025 | Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist | Shigeyuki Iwasa, Kaichiro Nakano, Katsumi Maeda, Etsuo Hasegawa | 1999-11-30 |
| 5985522 | Photoresist and compounds for composing the photoresist | Shigeyuki Iwasa, Kaichiro Nakano, Katsumi Maeda, Etsuo Hasegawa | 1999-11-16 |
| 5770346 | Photoresist and compounds for composing the photoresist | Shigeyuki Iwasa, Kaichiro Nakano, Katsumi Maeda, Etsuo Hasegawa | 1998-06-23 |
| 5665518 | Photoresist and monomer and polymer for composing the photoresist | Katsumi Maeda, Kaichiro Nakano, Etsuo Hasegawa | 1997-09-09 |