Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7871943 | Method of making transistor gates with controlled work function | Tim Boescke | 2011-01-18 |
| 7863136 | Method of manufacturing integrated circuits including a FET with a gate spacer and a fin | Matthias Goldbach, Jessica Hartwich, Lars Dreeskornfeld, Arnd Scholz | 2011-01-04 |
| 7718475 | Method for manufacturing an integrated circuit including a transistor | Matthias Goldbach, Erhard Landgraf, Michael Stadtmueller, Moritz Haupt, Sven Schmidbauer +1 more | 2010-05-18 |
| 7622354 | Integrated circuit and method of manufacturing an integrated circuit | Lars Dreeskornfeld, Jessica Hartwich, Arnd Scholz, Stefan Slesazeck | 2009-11-24 |
| 7618867 | Method of forming a doped portion of a semiconductor and method of forming a transistor | Frank Jakubowski, Hermann Sachse, Lars Voelkel, Klaus-Dieter Morhard, Dietmar Henke | 2009-11-17 |
| 7107562 | Method and apparatus for the arrangement of contact-making elements of components of an integrated circuit, computer-readable storage medium and program element | Paul D. Schroder | 2006-09-12 |
| 7049241 | Method for forming a trench in a layer or a layer stack on a semiconductor wafer | Uwe Schroeder, Matthias Goldbach | 2006-05-23 |
| 6897943 | Method and apparatus for aerial image improvement in projection lithography using a phase shifting aperture | Uwe Schroeder | 2005-05-24 |
| 6828647 | Structure for determining edges of regions in a semiconductor wafer | Thomas Schafbauer, Andreas Von Ehrenwall | 2004-12-07 |
| 6605396 | Resolution enhancement for alternating phase shift masks | Uwe Schroeder, Veit Klee | 2003-08-12 |
| 6579650 | Method and apparatus for determining photoresist pattern linearity | Paul Schroeder | 2003-06-17 |
| 6566227 | Strap resistance using selective oxidation to cap DT poly before STI etch | Paul Wensley, Martin Commons, Veit Klee | 2003-05-20 |
| 6551874 | Self-aligned STI process using nitride hard mask | John Pohl, Nirmal Chaudhary, Veit Klee, Paul Schroeder | 2003-04-22 |
| 6440759 | Method of measuring combined critical dimension and overlay in single step | Martin Commons, Velt Klee, John Pohl, Paul Wensley | 2002-08-27 |