Issued Patents All Time
Showing 51–75 of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6251558 | Chemically amplified resist | Klaus Elian, Ewald Guenther | 2001-06-26 |
| 6171755 | Chemically amplified resist | Klaus Elian, Ewald Karl Michael Günther | 2001-01-09 |
| 6110637 | Photoresists which are suitable for producing sub-micron size structures | Recai Sezi, Horst Borndoerfer, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 2000-08-29 |
| 6042993 | Photolithographic structure generation process | Ewald Karl Michael Günther, Albert Hammerschmidt, Gertrud Falk | 2000-03-28 |
| 5863705 | Photolithographic pattern generation | Recai Sezi, Erwin Schmidt | 1999-01-26 |
| 5851733 | Photolithographic pattern generation | Recai Sezi, Erwin Schmidt | 1998-12-22 |
| 5733706 | Dry-developable positive resist | Recai Sezi, Horst Borndorfer, Eva Rissel, Michael Sebald, Hellmut Ahne +2 more | 1998-03-31 |
| 5703186 | Mixed polymers | Recai Sezi, Horst Borndoerfer, Hellmut Ahne, Siegfried Birkle, Eberhard Kuehn +2 more | 1997-12-30 |
| 5668625 | Apparatus for and method for handling film in a photographic printer | Siegfried Bocklisch, Wolfgang Fielder, Helmut Treiber, Wilfried Reichel, Michael Wilde | 1997-09-16 |
| 5616667 | Copolymers | Recai Sezi, Horst Borndoerfer, Hellmut Ahne, Siegfried Birkle, Eberhard Kuehn +2 more | 1997-04-01 |
| 5556812 | Connection and build-up technique for multichip modules | Hellmut Ahne, Siegfried Birkle, Albert Hammerschmidt, Recai Sezi, Tobias Noll +1 more | 1996-09-17 |
| 5512334 | Method for the production of a bottom resist | Recai Sezi, Michael Sebald | 1996-04-30 |
| 5384220 | Production of photolithographic structures | Recai Sezi, Horst Borndoerfer, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 1995-01-24 |
| 5368901 | Method for the production of a bottom resist | Recai Sezi, Michael Sebald | 1994-11-29 |
| 5360693 | Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance | Michael Sebald, Recai Sezi, Seigfried Birkle, Hellmut Ahhe | 1994-11-01 |
| 5275920 | Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water | Recai Sezi, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 1994-01-04 |
| 5262283 | Method for producing a resist structure | Recai Sezi, Horst Borndorfer, Eva Rissel, Michael Sebald, Hellmut Ahne +1 more | 1993-11-16 |
| 5250375 | Photostructuring process | Michael Sebald, Juergen Beck, Recai Sezi, Siegfried Birkle, Hellmut Ahne +1 more | 1993-10-05 |
| 5234793 | Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development | Michael Sebald, Recai Sezi, Siegfried Birkle, Hellmut Ahne | 1993-08-10 |
| 5234794 | Photostructuring method | Michael Sebald, Recai Sezi, Siegfried Birkle, Hellmut Ahne | 1993-08-10 |
| 5229258 | Method for producing a resist structure | Recai Sezi, Horst Borndorfer, Eva Rissel, Michael Sebald, Hellmut Ahne +1 more | 1993-07-20 |
| 5194629 | Process for producing N-tertiary butoxycarbonyl-maleinimide | Eberhard Kuehn, Juergen Beck, Hellmut Ahne, Siegfried Birkle, Michael Sebald +2 more | 1993-03-16 |
| 5173393 | Etch-resistant deep ultraviolet resist process having an aromatic treating step after development | Recai Sezi, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 1992-12-22 |
| 5171656 | Photosensitive composition | Michael Sebald, Juergen Beck, Recai Sezi, Hans Jurgen Bestmann | 1992-12-15 |
| 5037876 | Planarizing dielectric | Siegfried Birkle, Albert Hammerschmidt, Johann Kammermaier, Rolf Schulte | 1991-08-06 |