Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10014464 | Combined CMP and RIE contact scheme for MRAM applications | Michael F. Lofaro, Janusz J. Nowak, Eugene J. O'Sullivan | 2018-07-03 |
| 9947863 | Structure and method to reduce shorting in STT-MRAM device | Anthony J. Annunziata, Gen P. Lauer | 2018-04-17 |
| 9853210 | Reduced process degradation of spin torque magnetoresistive random access memory | Anthony J. Annunziata, Gen P. Lauer, Stephen M. Rossnagel | 2017-12-26 |
| 9748310 | Structure and method to reduce shorting in STT-MRAM device | Anthony J. Annunziata, Gen P. Lauer | 2017-08-29 |
| 9728717 | Magnetic tunnel junction patterning using low atomic weight ion sputtering | Anthony J. Annunziata, Rohit Kilaru, Hiroyuki Miyazoe | 2017-08-08 |
| 9705077 | Spin torque MRAM fabrication using negative tone lithography and ion beam etching | Anthony J. Annunziata, Armand A. Galan, Steve Holmes, Eric A. Joseph, Gen P. Lauer +1 more | 2017-07-11 |
| 9691972 | Low temperature encapsulation for magnetic tunnel junction | Anthony J. Annunziata, Sebastian U. Engelmann, Eric A. Joseph, Gen P. Lauer, Deborah A. Neumayer +1 more | 2017-06-27 |
| 9673386 | Structure and method to reduce shorting in STT-MRAM device | Anthony J. Annunziata, Gen P. Lauer | 2017-06-06 |
| 9660179 | Enhanced coercivity in MTJ devices by contact depth control | Anthony J. Annunziata, Gen P. Lauer | 2017-05-23 |
| 9515252 | Low degradation MRAM encapsulation process using silicon-rich silicon nitride film | Anthony J. Annunziata, Chandrasekaran Kothandaraman, Gen P. Lauer, Junghyuk Lee, Deborah A. Neumayer +2 more | 2016-12-06 |
| 9502640 | Structure and method to reduce shorting in STT-MRAM device | Anthony J. Annunziata, Gen P. Lauer | 2016-11-22 |
| 9490164 | Techniques for forming contacts for active BEOL | Sebastian U. Engelmann, Steve Holmes, Qinghuang Lin, Eugene J. O'Sullivan | 2016-11-08 |
| 9450180 | Structure and method to reduce shorting in STT-MRAM device | Anthony J. Annunziata, Gen P. Lauer | 2016-09-20 |
| 9214355 | Molecular radical etch chemistry for increased throughput in pulsed plasma applications | Sebastian U. Engelmann, Masahiro Nakamura | 2015-12-15 |