| 5656514 |
Method for making heterojunction bipolar transistor with self-aligned retrograde emitter profile |
David C. Ahlgren, Jack O. Chu, Paul A. Ronsheim, Mary J. Saccamango, David Sunderland |
1997-08-12 |
| 5385850 |
Method of forming a doped region in a semiconductor substrate utilizing a sacrificial epitaxial silicon layer |
Jack O. Chu, Chang-Ming Hsieh, Victor R. Nastasi, Paul A. Ronsheim |
1995-01-31 |
| 5132765 |
Narrow base transistor and method of fabricating same |
Jeffrey L. Blouse, Inge G. Fulton, Russell C. Lange, Bernard S. Meyerson, Karen A. Nummy +1 more |
1992-07-21 |
| 5008207 |
Method of fabricating a narrow base transistor |
Jeffrey L. Blouse, Inge G. Fulton, Russell C. Lange, Bernard S. Meyerson, Karen A. Nummy +1 more |
1991-04-16 |
| 4701998 |
Method for fabricating a bipolar transistor |
David C. Ahlgren, Robert E. Bendernagel, Russell C. Lange |
1987-10-27 |
| 4667395 |
Method for passivating an undercut in semiconductor device preparation |
David C. Ahlgren, William H. Ma |
1987-05-26 |
| 4437108 |
Double polysilicon contact structure |
James R. Gardiner, Stanley R. Makarewicz, Joseph F. Shepard, Jr. |
1984-03-13 |
| 4394406 |
Double polysilicon contact structure and process |
James R. Gardiner, Stanley R. Makarewicz, Joseph F. Shepard, Jr. |
1983-07-19 |
| 4354309 |
Method of manufacturing a metal-insulator-semiconductor device utilizing a graded deposition of polycrystalline silicon |
James R. Gardiner, William A. Pliskin, Joseph F. Shepard, Jr. |
1982-10-19 |
| 4341009 |
Method for making an electrical contact to a silicon substrate through a relatively thin layer of silicon dioxide on the surface of the substrate |
Robert F. Bartholomew, Paul L. Garbarino, James R. Gardiner, Joseph F. Shepard, Jr. |
1982-07-27 |
| 4249968 |
Method of manufacturing a metal-insulator-semiconductor utilizing a multiple stage deposition of polycrystalline layers |
James R. Gardiner, William A. Pliskin, Joseph F. Shepard, Jr. |
1981-02-10 |
| 4191603 |
Making semiconductor structure with improved phosphosilicate glass isolation |
Paul L. Garbarino, Joseph F. Shepard, Jr. |
1980-03-04 |
