Issued Patents All Time
Showing 76–90 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6265130 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Jae Chang Jung, Min Ho Jung, Cheol Kyu Bok | 2001-07-24 |
| 6248847 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2001-06-19 |
| 6235448 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2001-05-22 |
| 6235447 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2001-05-22 |
| 6225020 | Polymer and a forming method of a micro pattern using the same | Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee +2 more | 2001-05-01 |
| 6200731 | Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2001-03-13 |
| 6165672 | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | Jae Chang Jung, Keun Kyu Kong, Cheol Kyu Bok | 2000-12-26 |
| 6156668 | Method for forming a fine pattern in a semiconductor device | Hyung Gi Kim, Myung-Soo Kim, Cheol Kyu Bok, Dae Hoon Lee, Jin Woong Kim +1 more | 2000-12-05 |
| 6150069 | Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Jae Chang Jung, Chi Hyeong Roh, Min Ho Jung, Geun Su Lee | 2000-11-21 |
| 6143463 | Method and photoresist using a photoresist copolymer | Jae Chang Jung, Cheol Kyu Bok | 2000-11-07 |
| 6132926 | ArF photoresist copolymers | Jae Chang Jung, Cheol Kyu Bok | 2000-10-17 |
| 5989788 | Method for forming resist patterns having two photoresist layers and an intermediate layer | Sang Man Bae | 1999-11-23 |
| 5830624 | Method for forming resist patterns comprising two photoresist layers and an intermediate layer | Sang Man Bae | 1998-11-03 |
| 5821034 | Method for forming micro patterns of semiconductor devices | Hyeong Soo Kim, Chang Mun Lim | 1998-10-13 |
| 5759748 | Method for forming photoresist pattern | Jun Sung Chun, Yong-Suk Lee | 1998-06-02 |