HS

Hiroaki Shishido

HO Hoya: 63 patents #5 of 1,290Top 1%
HI Hitachi: 16 patents #2,438 of 28,497Top 9%
SC Shindengen Electric Manufacturing Co.: 8 patents #20 of 307Top 7%
HI Hitach: 1 patents #1 of 68Top 2%
UO University Public Corporation Osaka: 1 patents #34 of 141Top 25%
Overall (All Time): #18,357 of 4,157,543Top 1%
89
Patents All Time

Issued Patents All Time

Showing 26–50 of 89 patents

Patent #TitleCo-InventorsDate
10712655 Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device Yasutaka HORIGOME 2020-07-14
10712652 Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask Takahiro Hiromatsu, Seishi SHIBAYAMA 2020-07-14
10606164 Mask blank, phase shift mask, and method for manufacturing semiconductor device Osamu Nozawa, Takenori Kajiwara 2020-03-31
10571797 Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device Osamu Nozawa, Ryo Ohkubo 2020-02-25
10551734 Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device Osamu Nozawa, Takenori Kajiwara 2020-02-04
10539866 Mask blank, phase-shift mask, and method of manufacturing semiconductor device Osamu Nozawa, Kazuya Sakai 2020-01-21
10527931 Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device Osamu Nozawa, Ryo Ohkubo, Yasushi Okubo 2020-01-07
10481486 Mask blank, phase shift mask, and method for manufacturing semiconductor device Osamu Nozawa, Takenori Kajiwara 2019-11-19
10444620 Mask blank, phase-shift mask and method for manufacturing semiconductor device Atsushi Matsumoto, Takashi Uchida 2019-10-15
10365555 Mask blank, transfer mask and methods of manufacturing the same Osamu Nozawa, Ryo Ohkubo 2019-07-30
10365556 Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device Osamu Nozawa 2019-07-30
10261409 Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device Osamu Nozawa 2019-04-16
10180622 Mask blank, phase-shift mask, method of manufacturing mask blank, method of manufacturing phase-shift mask and method of manufacturing semiconductor device Kazuya Sakai 2019-01-15
10146123 Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device Osamu Nozawa, Takenori Kajiwara 2018-12-04
10114281 Mask blank, phase shift mask, and method for manufacturing semiconductor device Osamu Nozawa, Takenori Kajiwara 2018-10-30
10101650 Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device Osamu Nozawa, Ryo Ohkubo, Yasushi Okubo 2018-10-16
10088744 Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device Osamu Nozawa, Takashi Uchida 2018-10-02
9939723 Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device Osamu Nozawa, Takashi Uchida 2018-04-10
9933698 Mask blank, phase-shift mask and method for manufacturing semiconductor device Atsushi Matsumoto, Takashi Uchida 2018-04-03
9864268 Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device Osamu Nozawa 2018-01-09
9726972 Mask blank, transfer mask, and method for manufacturing transfer mask Ryo Ohkubo, Osamu Nozawa 2017-08-08
9664997 Method of manufacturing mask blank and method of manufacturing transfer mask Atsushi Kominato, Osamu Nozawa 2017-05-30
9625806 Mask blank, phase-shift mask, and method for manufacturing the same Osamu Nozawa, Kazuya Sakai 2017-04-18
9625807 Mask blank, transfer mask, method of manufacturing a mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor device Atsushi Kominato, Osamu Nozawa, Toshiharu Kikuchi 2017-04-18
9436079 Phase shift mask blank, method of manufacturing the same, and phase shift mask Osamu Nozawa, Kazuya Sakai 2016-09-06