Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5917211 | Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same | Jun Murata, Yoshitaka Tadaki, Hiroko Kaneko, Toshihiro Sekiguchi, Hiroyuki Uchiyama +15 more | 1999-06-29 |
| 5868854 | Method and apparatus for processing samples | Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more | 1999-02-09 |
| 5822081 | Facsimile apparatus with improved network control and power supply section arrangement | Yasuhiro Hatano, Hajime Takayama, Yasushi Fukada, Kazuhiko Kurita | 1998-10-13 |
| 5734188 | Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same | Jun Murata, Yoshitaka Tadaki, Hiroko Kaneko, Toshihiro Sekiguchi, Hiroyuki Uchiyama +15 more | 1998-03-31 |
| 5661061 | Process for fabricating a semiconductor integrated circuit device having the multi-layered fin structure | Hirohisa Usuami, Kazuyuki Tsunokuni, Masayuki Kojima, Keiji Okamoto | 1997-08-26 |
| 5646489 | Plasma generator with mode restricting means | Yutaka Kakehi, Yoshinao Kawasaki, Keizo Suzuki, Hiromichi Enami, Tetsunori Kaji +2 more | 1997-07-08 |
| 5568277 | Facsimile apparatus with improved control board arrangement | Yasuhiro Hatano, Hajime Takayama, Yasushi Fukada, Kazuhiko Kurita | 1996-10-22 |
| 5452110 | Compact facsimile apparatus with improved component arrangement | Yasuhiro Hatano, Hajime Takayama, Yasushi Fukada, Kazuhiko Kurita | 1995-09-19 |
| 5433789 | Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves | Yutaka Kakehi, Yoshinao Kawasaki, Keizo Suzuki, Hiromichi Enami, Tetsunori Kaji +2 more | 1995-07-18 |
| 5264712 | Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same | Jun Murata, Yoshitaka Tadaki, Hiroko Kaneko, Toshihiro Sekiguchi, Hiroyuki Uchiyama +15 more | 1993-11-23 |
| 5200017 | Sample processing method and apparatus | Yoshinao Kawasaki, Hironobu Kawahara, Yoshiaki Sato, Ryooji Fukuyama, Yoshimi Torii | 1993-04-06 |
| 5007981 | Method of removing residual corrosive compounds by plasma etching followed by washing | Yoshinao Kawasaki, Hironobu Kawahara, Yoshiaki Sato, Ryooji Fukuyama, Yoshimi Torii | 1991-04-16 |