| 6224676 |
Gas supply apparatus and film forming apparatus |
Katsunori Nakajima, Hiroyuki Shida, Koji Ishiguro, Hikaru Saruta |
2001-05-01 |
| 6196155 |
Plasma processing apparatus and method of cleaning the apparatus |
Kouji Ishiguro, Hajime Murakami, Hirofumi Seki |
2001-03-06 |
| 6084356 |
Plasma processing apparatus with a dielectric body in the waveguide |
Hirofumi Seki, Satoshi Ichimura, Satoshi Takemori, Kouji Ishiguro, Yasuhiro Mochizuki +2 more |
2000-07-04 |
| 5783055 |
Multi-chamber sputtering apparatus |
Mitsuhiro Kamei, Satoshi Umehara |
1998-07-21 |
| 5429729 |
Sputtering apparatus, device for exchanging target and method for the same |
Mitsuhiro Kamei |
1995-07-04 |
| 5376777 |
Control apparatus and method for a substrate tray on an in-line sputtering apparatus |
Mitsuhiro Kamei |
1994-12-27 |
| 5116482 |
Film forming system using high frequency power and power supply unit for the same |
Mitsuhiro Kamei |
1992-05-26 |
| 5085755 |
Sputtering apparatus for forming thin films |
Mitsuhiro Kamei, Yasunori Ohno |
1992-02-04 |
| 5061356 |
Vacuum treatment apparatus and vacuum treatment method |
Shigeru Tanaka, Shinzou Oikawa, Sigeki Yamamura |
1991-10-29 |
| 4986890 |
Thin film deposition system |
Mitsuhiro Kamei |
1991-01-22 |
| 4911815 |
Sputtering apparatus for production of thin films of magnetic materials |
Mitsuhiro Kamei, Shinzou Oikawa |
1990-03-27 |
| 4865709 |
Magnetron sputter apparatus and method for forming films by using the same apparatus |
Yukio Nakagawa, Ken-ichi Natsui, Youichi Ohshita, Tadashi Sato, Mitsuhiro Kamei |
1989-09-12 |
| 4673482 |
Sputtering apparatus |
Keiji Arimatsu, Youichi Ohshita |
1987-06-16 |