Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5680050 | Battery condition detection method | Toshiyuki Kawai, Mitsunobu Uchida, Hidetoshi Kato, Torahiko Sasaki | 1997-10-21 |
| 5676811 | Air-fuel ratio detecting device | Hisayoshi Ohta, Keigo Mizutani, Masataka Naito, Masanori Yamada, Masahiro Shibata +1 more | 1997-10-14 |
| 5650712 | Method for detecting remaining battery current, voltage, and temperature capacity by continuously monitoring | Toshiyuki Kawai, Mitsunobu Uchida | 1997-07-22 |
| 5238549 | Oxygen concentration detector | Masataka Naito, Masahiro Shibata | 1993-08-24 |
| 4847358 | Process for producing polyamide acid having siloxane bonds and polyimide having siloxane bonds and isoindoloquinazolinedione rings | Mitsumasa Kojima, Takayuki Saito, Toul Kikuchi, Shun-ichiro Uchimura, Hidetaka Satou | 1989-07-11 |
| 4803543 | Semiconductor device and process for producing the same | Hideo Inayoshi, Akira Suzuki, Kunihiro Tsubosaki, Toyoichi Ueda, Nobuo Ichimura +1 more | 1989-02-07 |
| 4801519 | Process for producing a pattern with negative-type photosensitive composition | Shigeru Koibuchi, Asao Isobe, Yutaka Takeda | 1989-01-31 |
| 4758476 | Polyimide precursor resin composition and semiconductor device using the same | Hiroyoshi Sekine, Hiroshi Suzuki, Hidetaka Sato, Shun-ichiro Uchimura | 1988-07-19 |
| 4758875 | Resin encapsulated semiconductor device | Koji Fujisaki, Akio Nishikawa, Shunichi Numata, Hiroshi Suzuki, Takeshi Komaru | 1988-07-19 |
| 4735492 | Liquid crystal orientation controlling film and liquid crystal device using the same | Hiroyoshi Sekine, Hidetaka Satou | 1988-04-05 |
| 4722883 | Process for producing fine patterns | Shigeru Koibuchi, Asao Isobe | 1988-02-02 |
| 4698291 | Photosensitive composition with 4-azido-2'-methoxychalcone | Shigeru Koibuchi, Asao Isobe | 1987-10-06 |
| 4645688 | Composition for protective coating material | Hidetaka Sato, Hiroshi Suzuki, Shun-ichiro Uchimura | 1987-02-24 |
| 4554237 | Photosensitive resin composition and method for forming fine patterns with said composition | Fumio Kataoka, Fusaji Shoji, Hitoshi Yokono, Shigeru Koibuchi, Asao Isobe | 1985-11-19 |
| 4513077 | Electron beam or X-ray reactive image-formable resinous composition | Asao Isobe, Hiroshi Shiraishi | 1985-04-23 |
| 4511705 | Composition for protective coating material | Hidetaka Sato, Shun-ichiro Uchimura, Hiroshi Suzuki | 1985-04-16 |
| 4497922 | Compositions of materials for forming protective film in semiconductor device | Hidetaka Sato, Shunichiro Uchimura, Isao Uchigasaki | 1985-02-05 |
| 4494217 | Semiconductor memories with .alpha. shield | Hiroshi Suzuki, Goro Tanaka, Akio Nishikawa, Junji Mukai, Mikio Sato +1 more | 1985-01-15 |
| 4485234 | Method of preparing polyamide acid for processing of semiconductors | Yasuo Miyadera | 1984-11-27 |
| 4447596 | Method of preparing polyamide acid for processing of semiconductors | Yasuo Miyadera | 1984-05-08 |
| 4338426 | Intermediate, copolymer resin and production thereof | Hidetaka Sato, Shunichiro Uchimura, Hiroshi Suzuki | 1982-07-06 |
| 4338427 | Process for producing polyimide-amide-carboxylic acid | Iwao Maekawa | 1982-07-06 |
| 4225702 | Method of preparing polyamide acid type intermediates for processing of semiconductors | Yasuo Miyadera, Seiki Harada, Atsushi Saiki | 1980-09-30 |