YN

Yoshiyuki Nakao

Fujitsu Limited: 9 patents #3,538 of 24,456Top 15%
FL Fujitsu Semiconductor Limited: 8 patents #65 of 1,301Top 5%
NM Nippon Steel & Sumitomo Metal: 5 patents #197 of 1,491Top 15%
NS Nippon Steel: 3 patents #914 of 4,423Top 25%
FL Fujitsu Microelectronics Limited: 2 patents #92 of 624Top 15%
SI Sumitomo Metal Industries: 2 patents #334 of 1,462Top 25%
Overall (All Time): #129,308 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 1–25 of 29 patents

Patent #TitleCo-InventorsDate
11965856 Method and device for detecting metal residue in electric-resistance-welded steel pipe Toshiyuki Suzuma 2024-04-23
11193910 Device and method of detecting magnetic characteristic change for long material Toshiyuki Suzuma, Yoshiyuki Ota 2021-12-07
10416123 Flaw detection sensitivity adjustment method and abnormality diagnosis method for ultrasonic probe Masaki Yamano, Shigetoshi Hyodo, Masaki Tanaka, Tsukasa Suda 2019-09-17
9559058 Semiconductor device and method for manufacturing the same Masaki Haneda, Michie Sunayama, Noriyoshi Shimizu, Nobuyuki Ohtsuka, Takahiro Tabira 2017-01-31
9291599 Magnetic testing method and apparatus Toshiyuki Suzuma, Makoto Sakamoto, Yoshiyuki Oota 2016-03-22
9121833 Defect inspecting apparatus Kazunori Anayama, Toshiyuki Suzuma, Masami Ikeda, Kenta Sakai 2015-09-01
8803516 Eddy current testing method and apparatus for inspecting an object for flaws Takashi Hibino, Takashi Fujimoto, Keisuke Komatsu, Makoto Takata, Makoto Sakamoto 2014-08-12
8685265 Manufacturing method of semiconductor device and semiconductor manufacturing apparatus Kazuo Hashimi 2014-04-01
8638091 Rotary eddy current testing probe device Takashi Hibino, Takashi Fujimoto, Shigeki Namekata, Keisuke Komatsu, Makoto Takata +1 more 2014-01-28
8552717 Eddy current testing method and eddy current testing apparatus Shigetoshi Hyodo 2013-10-08
8497208 Semiconductor device and method for manufacturing the same Michie Sunayama, Noriyoshi Shimizu 2013-07-30
8168532 Method of manufacturing a multilayer interconnection structure in a semiconductor device Masaki Haneda, Michie Sunayama, Noriyoshi Shimizu, Nobuyuki Ohtsuka, Takahiro Tabira 2012-05-01
8104349 Flaw detection tracking device for pipe or tube and automatic flaw detecting apparatus for pipe or tube using the same Hiroshi Kubota, Masami Ikeda, Nobuyuki Mori, Hiroshi Sato 2012-01-31
8071474 Method of manufacturing semiconductor device suitable for forming wiring using damascene method Noriyoshi Shimizu, Nobuyuki Ohtsuka, Hideki Kitada 2011-12-06
8067309 Semiconductor device using metal nitride as insulating film and its manufacture method Noriyoshi Shimizu, Hiroki Kondo, Takashi Suzuki, Nobuyuki Nishikawa 2011-11-29
8067836 Semiconductor device with reduced increase in copper film resistance Masaki Haneda, Noriyoshi Shimizu, Nobuyuki Ohtsuka, Michie Sunayama, Takahiro Tabira 2011-11-29
8027796 S/N ratio measuring method in eddy current testing on internal surface of pipe or tube Shoji Kinomura, Toshiya Kodai, Shugo Nishiyama 2011-09-27
7935624 Fabrication method of semiconductor device having a barrier layer containing Mn Nobuyuki Ohtsuka, Noriyoshi Shimizu, Hisaya Sakai 2011-05-03
7846833 Manufacture method for semiconductor device suitable for forming wirings by damascene method and semiconductor device Hideki Kitada, Nobuyuki Ohtsuka, Noriyoshi Shimizu 2010-12-07
7816279 Semiconductor device and method for manufacturing the same Michie Sunayama, Noriyoshi Shimizu 2010-10-19
7713869 Manufacture method for semiconductor device suitable for forming wirings by damascene method and semiconductor device Hideki Kitada, Nobuyuki Ohtsuka, Noriyoshi Shimizu 2010-05-11
7507666 Manufacture method for semiconductor device having concave portions filled with conductor containing Cu as its main composition Hideki Kitada, Nobuyuki Ohtsuka, Noriyoshi Shimizu 2009-03-24
7507659 Fabrication process of a semiconductor device Nobuyuki Ohtsuka, Noriyoshi Shimizu 2009-03-24
7413977 Method of manufacturing semiconductor device suitable for forming wiring using damascene method Noriyoshi Shimizu, Nobuyuki Ohtsuka, Hideki Kitada 2008-08-19
7256500 Semiconductor device using metal nitride as insulating film Noriyuki Shimizu, Hiroki Kondo, Takashi Suzuki, Nobuyuki Nishikawa 2007-08-14