Issued Patents All Time
Showing 51–66 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5721091 | Composition for forming an electrically conductive layer to be used in patterning | Keiji Watanabe, Takashi Maruyama, Keiko Yano, Tomio Nakamura, Shigeru Shimizu +1 more | 1998-02-24 |
| 5658966 | Method of coupling optical parts and refractive index imaging material | Koji Tsukamoto, Takeshi Ishitsuka, Tetsuzo Yoshimura, Katsusada Motoyoshi | 1997-08-19 |
| 5581646 | Method of coupling optical parts and refractive index imaging material | Koji Tsukamoto, Takeshi Ishitsuka, Tetsuzo Yoshimura, Katsusada Motoyoshi | 1996-12-03 |
| 5560870 | Composition for forming an electrically conductive layer to be used in patterning | Keiji Watanabe, Takashi Maruyama, Keiko Yano, Tomio Nakamura, Shigeru Shimizu +1 more | 1996-10-01 |
| 5222684 | Tape driving apparatus for tape medium record reproducing apparatus | Haruo Hiraishi | 1993-06-29 |
| 5091285 | Method of forming pattern by using an electroconductive composition | Keiji Watanabe, Koichi Kobayashi, Keiko Yano, Tomio Nakamura, Shigeru Shimizu | 1992-02-25 |
| 4988514 | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board | Shun-ichi Fukuyama, Masashi Miyagawa, Kota Nishii, Azuma Matsuura | 1991-01-29 |
| 4863833 | Pattern-forming material and its production and use | Shun-ichi Fukuyama, Masashi Miyagawa, Kota Nishii | 1989-09-05 |
| 4670299 | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board | Shun-ichi Fukuyama, Masashi Miyagawa, Kota Nishii, Azuma Matsuura | 1987-06-02 |
| 4657843 | Use of polysilsesquioxane without hydroxyl group for forming mask | Shun-ichi Fukuyama, Masashi Miyagawa, Kota Nishii | 1987-04-14 |
| 4481279 | Dry-developing resist composition | Jiro Naito, Kenroh Kitamura | 1984-11-06 |
| 4464455 | Dry-developing negative resist composition | Kenroh Kitamura, Jiro Naito, Toshisuke Kitakohji | 1984-08-07 |
| 4345020 | Positive resist polymer composition and method of forming resist pattern | Toshisuke Kitakohji, Kenro Kitamura | 1982-08-17 |
| 4276365 | Positive resist terpolymer composition and method of forming resist pattern | Toshisuke Kitakohji, Kenro Kitamura | 1981-06-30 |
| 4273856 | Positive resist terpolymer composition and method of forming resist pattern | Toshisuke Kitakohji, Kenro Kitamura | 1981-06-16 |
| 4267258 | Negative type deep ultraviolet resist | Kenro Kitamura, Jiro Naito, Toshisuke Kitakohji | 1981-05-12 |