Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5994144 | Simplified environmental atmosphere measuring method | Eiichi Nakajima, Yasuo Udoh, Tsutomu Iikawa, Teruo Motoyoshi, Takashi Furusawa +5 more | 1999-11-30 |
| 5985213 | Simplified environmental atmosphere measuring apparatus | Eiichi Nakajima, Yasuo Udoh, Tsutomu Iikawa, Teruo Motoyoshi, Takashi Furusawa +5 more | 1999-11-16 |
| 5750406 | Environment monitoring test piece and test method | Eiichi Nakajima, Yasuo Udoh, Tsutomu Iikawa, Teruo Motoyoshi, Takashi Furusawa +5 more | 1998-05-12 |
| 4600685 | Patterning process using ladder-type organosiloxane resin and process for production of electronic devices utilizing said patterning process | Shiro Takeda, Minoru Nakajima, Hiroshi Tokunaga | 1986-07-15 |
| 4464455 | Dry-developing negative resist composition | Yasuhiro Yoneda, Kenroh Kitamura, Jiro Naito | 1984-08-07 |
| 4345020 | Positive resist polymer composition and method of forming resist pattern | Yasuhiro Yoneda, Kenro Kitamura | 1982-08-17 |
| 4276365 | Positive resist terpolymer composition and method of forming resist pattern | Yasuhiro Yoneda, Kenro Kitamura | 1981-06-30 |
| 4273856 | Positive resist terpolymer composition and method of forming resist pattern | Yasuhiro Yoneda, Kenro Kitamura | 1981-06-16 |
| 4267258 | Negative type deep ultraviolet resist | Yasuhiro Yoneda, Kenro Kitamura, Jiro Naito | 1981-05-12 |