Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7854787 | Method of removing coating from coated magnesium alloy product, method of making recycled magnesium alloy and method of recycling coating | Koichi Kimura | 2010-12-21 |
| 7222657 | Metal object forming method and mold used for the same | Koichi Kimura | 2007-05-29 |
| 7056445 | Method of removing paint applied to magnesium-alloy material | Koichi Kimura | 2006-06-06 |
| 6770812 | Metal housing with auxiliary parts glued to housing base | Koichi Kimura | 2004-08-03 |
| 5909819 | Box-shaped plastic housing of integrally molded resin | Katsura Adachi, Makoto Usui, Takashi Muraya, Toshihiro Kobayashi, Kazuyuki Tamura +1 more | 1999-06-08 |
| 5872699 | Electronic apparatus, housing for electronic apparatus and housing manufacturing method | Kouichi Kimura, Masanobu Ishizuki, Katsura Adachi, Hiroki Uchida | 1999-02-16 |
| 5631070 | Polyamide resin composition and housing for electronic equipment | Kouichi Kimura, Masanobu Ishizuka, Katsura Adachi | 1997-05-20 |
| 5470909 | Polyamide resin composition and housing for electronic equipment | Kouichi Kimura, Masanobu Ishizuka, Katsura Adachi | 1995-11-28 |
| 5254304 | Injection molding process for producing a box-shaped plastic housing | Katsura Adachi, Makoto Usui, Takashi Muraya, Toshihiro Kobayashi, Kazuyuki Tamura +1 more | 1993-10-19 |
| 4988514 | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board | Shun-ichi Fukuyama, Yasuhiro Yoneda, Masashi Miyagawa, Azuma Matsuura | 1991-01-29 |
| 4863833 | Pattern-forming material and its production and use | Shun-ichi Fukuyama, Yasuhiro Yoneda, Masashi Miyagawa | 1989-09-05 |
| 4670299 | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board | Shun-ichi Fukuyama, Yasuhiro Yoneda, Masashi Miyagawa, Azuma Matsuura | 1987-06-02 |
| 4657843 | Use of polysilsesquioxane without hydroxyl group for forming mask | Shun-ichi Fukuyama, Yasuhiro Yoneda, Masashi Miyagawa | 1987-04-14 |