KN

Kenji Nakagawa

Fujitsu Limited: 24 patents #1,085 of 24,456Top 5%
AT Autonetworks Technologies: 6 patents #276 of 1,079Top 30%
TO Toyota: 6 patents #4,786 of 26,838Top 20%
MI Misumi: 6 patents #1 of 22Top 5%
Sumitomo Electric Industries: 6 patents #4,612 of 21,551Top 25%
SS Sumitomo Wiring Systems: 6 patents #599 of 2,615Top 25%
HO Hoya: 4 patents #305 of 1,290Top 25%
AK Asahi Kasei Kabushiki Kaisha: 3 patents #181 of 1,220Top 15%
Canon: 2 patents #12,681 of 19,416Top 70%
KS Kawasaki Steel: 2 patents #570 of 1,922Top 30%
SC Sanyo Electric Co.: 2 patents #2,557 of 6,347Top 45%
NC Nittan Valve Co.: 1 patents #49 of 98Top 50%
NT Ntn: 1 patents #814 of 1,364Top 60%
OE Otis Elevator: 1 patents #966 of 1,840Top 55%
FC Fuji Electric Co.: 1 patents #1,354 of 2,643Top 55%
DD Ddk: 1 patents #47 of 97Top 50%
HZ Hitachi Zosen: 1 patents #216 of 531Top 45%
FC Fukuda Metal Foil & Powder Co.: 1 patents #50 of 95Top 55%
KA Kao: 1 patents #1,961 of 3,221Top 65%
MI Mipox: 1 patents #2 of 13Top 20%
UM Uchiyama Manufacturing: 1 patents #36 of 116Top 35%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
📍 Hadano, JP: #8 of 1,025 inventorsTop 1%
Overall (All Time): #34,629 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 51–64 of 64 patents

Patent #TitleCo-InventorsDate
5364716 Pattern exposing method using phase shift and mask used therefor Masao Kanazawa, Tamae Haruki, Yasuko Tabata 1994-11-15
5338647 Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface Kenichi Kawashima 1994-08-16
5276551 Reticle with phase-shifters and a method of fabricating the same 1994-01-04
5190836 Reflection type photomask with phase shifter Kenichi Kawashima 1993-03-02
5082695 Method of fabricating an X-ray exposure mask Masao Yamada, Masafumi Nakaishi, Yuji Furumura, Takashi Eshita, Fumitake Mieno 1992-01-21
5004927 Process for forming a fine pattern having a high aspect ratio 1991-04-02
4939052 X-ray exposure mask 1990-07-03
4881257 Deformation free X-ray exposure mask for X-ray lithography 1989-11-14
4767435 Process for producing transparent glass product having refractive index gradient Shigeaki Omi, Yoshiyuki Asahara, Seiichi Shingaki, Shin Nakayama, Tetsuro Izumitani +1 more 1988-08-30
4678919 Electron beam exposure method and apparatus Kenji Sugishima 1987-07-07
4643982 High-strength glass-ceramic containing anorthite crystals and process for producing the same Toshihiro Kasuga 1987-02-17
4624486 Structure at resin pipe connections Yoshinori Nishino, Masahiko Yamamoto, Tadayoshi Uda, Tomoyoshi Kanazawa 1986-11-25
4560666 High strength glass-ceramic containing apatite and alkaline earth metal silicate crystals and process for producing the same Masahiro Yoshida 1985-12-24
4391916 Alkali-free glass for photoetching mask Isao Masuda 1983-07-05