Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6806477 | Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same | Kenji Saito, Mitsuro Sugita | 2004-10-19 |
| 6753943 | Scanning exposure apparatus and device manufacturing method using the same | Akiyoshi Suzuki | 2004-06-22 |
| 6606195 | Optical unit and optical instrument having the same | — | 2003-08-12 |
| 6603532 | Illuminance measurement apparatus, exposure apparatus, and exposure method | Keizaburo Kawada | 2003-08-05 |
| 6549277 | Illuminance meter, illuminance measuring method and exposure apparatus | Hiroaki Narushima | 2003-04-15 |
| 6542222 | Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure system | Michiaki SAITO | 2003-04-01 |
| 6525817 | Inspection method and apparatus for projection optical systems | Tetsuo Taniguchi | 2003-02-25 |
| 6392742 | Illumination system and projection exposure apparatus | — | 2002-05-21 |
| 6285855 | Illumination system and exposure apparatus having the same | — | 2001-09-04 |
| 6211947 | Illuminance distribution measuring method, exposing method and device manufacturing method | — | 2001-04-03 |
| 6169602 | Inspection method and apparatus for projection optical systems | Tetsuo Taniguchi | 2001-01-02 |
| 6151122 | Inspection method and apparatus for projection optical systems | Tetsuo Taniguchi | 2000-11-21 |
| 6002467 | Exposure apparatus and method | Kenji Nishi, Takuzo Kashima | 1999-12-14 |
| 5894341 | Exposure apparatus and method for measuring a quantity of light with temperature variations | Kenji Nishi | 1999-04-13 |
| 5861952 | Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position | Kyoichi Miyazaki, Seiji Takeuchi, Minoru Yoshii, Noriyuki Nose | 1999-01-19 |
| 5798838 | Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same | Tetsuo Taniguchi, Tadashi Nagayama | 1998-08-25 |
| 5767962 | Inspection system and device manufacturing method using the same | Masayuki Suzuki, Noriyuki Nose, Minoru Yoshii, Kyoichi Miyazaki, Seiji Takeuchi | 1998-06-16 |
| 5751426 | Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object | Noriyuki Nose, Minoru Yoshii, Kenji Saitoh, Hiroshi Osawa, Koichi Sentoku +1 more | 1998-05-12 |
| 5742386 | Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same | Noriyuki Nose, Minoru Yoshii, Kyoichi Miyazaki, Seiji Takeuchi | 1998-04-21 |
| 5652657 | Inspection system for original with pellicle | Minoru Yoshii, Michio Kohno, Seiya Miura, Kyoichi Miyazaki, Seiji Takeuchi | 1997-07-29 |
| 5591985 | Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light | Michio Kohno | 1997-01-07 |
| 5585918 | Foreign particle inspecting system | Seiji Takeuchi, Kyoichi Miyazaki | 1996-12-17 |
| 5486919 | Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern | Seiji Takeuchi, Kyoichi Miyazaki, Minoru Yoshii, Noriyuki Nose, Tetsuzo Mori | 1996-01-23 |
| 5461474 | Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same | Minoru Yoshii, Noriyuki Nose, Masayuki Suzuki, Kyoichi Miyazaki, Seiji Takeuchi | 1995-10-24 |
| 5432603 | Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected | Koichi Sentoku, Noriyuki Nose, Minoru Yoshii, Kenji Saito, Takahiro Matsumoto | 1995-07-11 |