Issued Patents All Time
Showing 51–75 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6203618 | Exhaust system and vacuum processing apparatus | Junichiro Hashizume, Shigenori Ueda | 2001-03-20 |
| 6165274 | Plasma processing apparatus and method | Kazuyoshi Akiyama, Tatsuyuki Aoike, Toshiyasu Shirasuna, Kazuhiko Takada, Hitoshi Murayama | 2000-12-26 |
| 6155201 | Plasma processing apparatus and plasma processing method | Hitoshi Murayama, Toshiyasu Shirasuna, Kazuyoshi Akiyama, Takashi Ohtsuka, Kazuto Hosoi | 2000-12-05 |
| 6148763 | Deposited film forming apparatus | Kazuyoshi Akiyama, Toshiyasu Shirasuna, Kazuhiko Takada, Hitoshi Murayama | 2000-11-21 |
| 6135053 | Apparatus for forming a deposited film by plasma chemical vapor deposition | — | 2000-10-24 |
| 6078508 | Self-oscillation type switching power supply apparatus | Naoki Tanaka | 2000-06-20 |
| 5817181 | Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus | Kazuyoshi Akiyama, Hitoshi Murayama, Koji Hitsuishi, Satoshi Kojima, Hirokazu Ohtoshi +1 more | 1998-10-06 |
| 5656404 | Light receiving member with an amorphous silicon photoconductive layer containing fluorine atoms in an amount of 1 to 95 atomic ppm | Hiroaki Niino, Tetsuya Takei, Toshiyasu Shirasuna, Shigeru Shirai | 1997-08-12 |
| 5637358 | Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet | Hirokazu Otoshi, Keishi Saitoh, Koichi Matsuda | 1997-06-10 |
| 5624776 | Electrophotographic photosensitive member provided with a light receiving layer composed of a non-single crystal silicon material containing columnar structure regions and process for the production thereof | Tetsuya Takei, Hirokazu Ohtoshi, Takehito Yoshino, Yasuyoshi Takai | 1997-04-29 |
| 5597623 | Process for using microwave plasma CVD | Yasuyoshi Takai, Tetsuya Takei, Hirokazu Otoshi | 1997-01-28 |
| 5514506 | Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers | Yasuyoshi Takai, Tetsuya Takei, Hirokazu Otoshi, Hiroyuki Katagiri, Satoshi Kojima | 1996-05-07 |
| 5514217 | Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof | Hiroaki Niino, Tetsuya Takei, Masahiro Kanai | 1996-05-07 |
| 5480627 | Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member | Tetsuya Takei, Hirokazu Ohtoshi, Hiroyuki Katagiri, Yasuyoshi Takai | 1996-01-02 |
| 5455138 | Process for forming deposited film for light-receiving member, light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus | Kazuyoshi Akiyama, Hitoshi Murayama, Koji Hitsuishi, Satoshi Kojima, Hirokazu Ohtoshi +1 more | 1995-10-03 |
| 5443645 | Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure | Hirokazu Otoshi, Tetsuya Takei, Yasuyoshi Takai, Shigeru Shirai, Teruo Misumi | 1995-08-22 |
| 5439715 | Process and apparatus for microwave plasma chemical vapor deposition | Hirokazu Otoshi, Tetsuya Takei | 1995-08-08 |
| 5433790 | Deposit film forming apparatus with microwave CVD method | Hiroaki Niino, Tetsuya Takei | 1995-07-18 |
| 5407768 | Light-receiving member | Kazuyoshi Akiyama, Masaaki Yamamura, Koji Hitsuishi | 1995-04-18 |
| 5360484 | Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film | Yasuyoshi Takai, Tetsuya Takei, Hirokazu Otoshi | 1994-11-01 |
| 5314780 | Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member | Tetsuya Takei, Hirokazu Ohtoshi, Hiroyuki Katagiri, Yasuyoshi Takai | 1994-05-24 |
| 5284730 | Electrophotographic light-receiving member | Tetsuya Takei, Shigeru Shirai, Hirokazu Ohtoshi, Yasuyoshi Takai, Hiroyuki Katagiri | 1994-02-08 |
| 5273851 | Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C | Tetsuya Takei, Shigeru Shirai, Hirokazu Ootoshi, Yasuyoshi Takai | 1993-12-28 |
| 5232507 | Apparatus for forming deposited films with microwave plasma CVD method | Hirokazu Ohtoshi, Tetsuya Takei, Yasuyoshi Takai | 1993-08-03 |
| 5030476 | Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition | Hirokazu Otoshi, Tetsuya Takei | 1991-07-09 |