Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10488753 | Substrate pretreatment and etch uniformity in nanoimprint lithography | Timothy Brian Stachowiak, Weijun Liu, Fen Wan, Gary F. Doyle | 2019-11-26 |
| 10303049 | Reducing electric charge in imprint lithography | — | 2019-05-28 |
| 10304690 | Fluid dispense methodology and apparatus for imprint lithography | Dwayne L. LaBrake | 2019-05-28 |
| 10211051 | Method of reverse tone patterning | Dwayne L. LaBrake | 2019-02-19 |
| 10134588 | Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography | Weijun Liu, Timothy Brian Stachowiak, James DeYoung | 2018-11-20 |
| 10131134 | System and method for discharging electrostatic charge in nanoimprint lithography processes | — | 2018-11-20 |
| 10095106 | Removing substrate pretreatment compositions in nanoimprint lithography | Timothy Brian Stachowiak, Weijun Liu, Zhengmao Ye, Toshiki Ito | 2018-10-09 |
| 10035296 | Methods for controlling spread of imprint material | Zhengmao Ye, Edward Brian Fletcher | 2018-07-31 |
| 9778562 | Porous template and imprinting stack for nano-imprint lithography | Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Byung-Jin Choi +2 more | 2017-10-03 |
| 9651862 | Drop pattern generation for imprint lithography with directionally-patterned templates | Edward Brian Fletcher, Gerard Schmid, Se-Hyuk Im, Yeshwanth Srinivasan, Weijun Liu +1 more | 2017-05-16 |
| 9063409 | Nano-imprint lithography templates | Weijun Liu, Frank Y. Xu, Edward Brian Fletcher, Fen Wan | 2015-06-23 |
| 8967992 | Optically absorptive material for alignment marks | Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake | 2015-03-03 |
| 8968620 | Safe separation for nano imprinting | Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Gerard Schmid, Mario Johannes Meissl +4 more | 2015-03-03 |
| 8891080 | Contaminate detection and substrate cleaning | Dwayne L. LaBrake | 2014-11-18 |
| 8652393 | Strain and kinetics control during separation phase of imprint process | Frank Y. Xu, Mario Johannes Meissl, Michael Nevin Miller, Ecron D. Thompson, Gerard Schmid +3 more | 2014-02-18 |
| 8647554 | Residual layer thickness measurement and correction | Christopher Ellis Jones, Stephen C. Johnson, Philip D. Schumaker, Pankaj Lad | 2014-02-11 |
| 8641958 | Extrusion reduction in imprint lithography | Christopher Ellis Jones, Joseph G. Perez, Dwayne L. LaBrake, Ian McMackin | 2014-02-04 |
| 8545709 | Critical dimension control during template formation | Cynthia B. Brooks, Dwayne L. LaBrake, Michael Nevin Miller, Sidlgata V. Sreenivasan, David J. Lentz +1 more | 2013-10-01 |
| 8480933 | Fluid dispense device calibration | Van Nguyen Truskett, Stephen C. Johnson, Logan L. Simpson | 2013-07-09 |
| 8361371 | Extrusion reduction in imprint lithography | Christopher Ellis Jones, Joseph G. Perez, Dwayne L. LaBrake, Ian McMackin | 2013-01-29 |
| 8211214 | Single phase fluid imprint lithography method | Frank Y. Xu | 2012-07-03 |
| 7252869 | Microtextured antireflective surfaces with reduced diffraction intensity | Tanwin Chang | 2007-08-07 |
| 6958207 | Method for producing large area antireflective microtextured surfaces | Tanwin Chang | 2005-10-25 |