Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12332570 | Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris | Ronald Peter Albright, Kursat Bal, Vadim Yevgenyevich Banine, Richard Joseph Bruls, Sjoerd Frans DE VRIES +13 more | 2025-06-17 |
| 11846887 | Prolonging optical element lifetime in an EUV lithography system | Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more | 2023-12-19 |
| 11340532 | Prolonging optical element lifetime in an EUV lithography system | Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers +20 more | 2022-05-24 |