Issued Patents All Time
Showing 51–63 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7012674 | Maskless optical writer | — | 2006-03-14 |
| 6980277 | Immersion photolithography system and method using inverted wafer-projection optics interface | — | 2005-12-27 |
| 6977716 | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage | Jorge Ivaldi, John Shamaly | 2005-12-20 |
| 6972830 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system | — | 2005-12-06 |
| 6967713 | Use of multiple reticles in lithographic printing tools | Andrew W. McCullough, Christopher Mason, Louis John Markoya | 2005-11-22 |
| 6967712 | Apparatus and system for improving phase shift mask imaging performance and associated methods | — | 2005-11-22 |
| 6809794 | Immersion photolithography system and method using inverted wafer-projection optics interface | — | 2004-10-26 |
| 6800408 | Use of multiple reticles in lithographic printing tools | Andrew W. McCullough, Christopher Mason, Luis Markoya | 2004-10-05 |
| 6757110 | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage | Jorge Ivaldi, John Shamaly | 2004-06-29 |
| 6731374 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system | — | 2004-05-04 |
| 6628372 | Use of multiple reticles in lithographic printing tools | Andrew W. McCullough, Christopher Mason, Louis John Markoya | 2003-09-30 |
| 6611316 | Method and system for dual reticle image exposure | — | 2003-08-26 |
| 4933714 | Apparatus and method for reproducing a pattern in an annular area | Jere D. Buckley, Daniel N. Galburt, Charles Karatzas, Frits Zernike | 1990-06-12 |