Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12363970 | Germanium tin oxide-containing semiconductor device and methods for forming the same | Georgios Vellianitis, Gerben Doornbos, Marcus Johannes Henricus Van Dal | 2025-07-15 |
| 12310063 | Method for forming semiconductor device with transistors on opposite sides of a dielectric layer | Georgios Vellianitis, Gerben Doornbos, Marcus Johannes Henricus Van Dal | 2025-05-20 |
| 12068156 | Selective deposition of SiOC thin films | Jan Willem Maes, David Kurt de Roest | 2024-08-20 |
| 12021137 | Ni(Al)O p-type semiconductor via selective oxidation of NiAl and methods of forming the same | — | 2024-06-25 |
| 12002860 | Semiconductor device and fabrication method thereof | Georgios Vellianitis, Gerben Doornbos, Marcus Johannes Henricus Van Dal | 2024-06-04 |
| 11776807 | Plasma enhanced deposition processes for controlled formation of oxygen containing thin films | Lingyun Jia, Viljami Pore, Marko Tuominen, Sun Ja Kim | 2023-10-03 |
| 11728164 | Selective PEALD of oxide on dielectric | Eva Tois, Viljami Pore, Suvi Haukka, Toshiya Suzuki, Lingyun Jia +1 more | 2023-08-15 |
| 11664219 | Selective deposition of SiOC thin films | Jan Willem Maes, David Kurt de Roest | 2023-05-30 |
| 11664222 | Atomic layer deposition of indium gallium zinc oxide | Andrea Illiberi, Michael Eugene Givens, Tatiana Ivanova, Charles Dezelah, Varun Sharma | 2023-05-30 |
| 11501965 | Plasma enhanced deposition processes for controlled formation of metal oxide thin films | Lingyun Jia, Viljami Pore, Marko Tuominen, Sun Ja Kim, Eva Tois +2 more | 2022-11-15 |
| 11170993 | Selective PEALD of oxide on dielectric | Eva Tois, Viljami Pore, Suvi Haukka, Toshiya Suzuki, Lingyun Jia +1 more | 2021-11-09 |
| 11158500 | Plasma enhanced deposition processes for controlled formation of oxygen containing thin films | Lingyun Jia, Viljami Pore, Marko Tuominen, Sun Ja Kim | 2021-10-26 |
| 11139163 | Selective deposition of SiOC thin films | Jan Willem Maes, David Kurt de Roest | 2021-10-05 |
| 10607895 | Method for forming a semiconductor device structure comprising a gate fill metal | Qi Xie, Chiyu Zhu, Kiran Shrestha, Pauline Calka, Jan Willem Maes +1 more | 2020-03-31 |