Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6764808 | Self-aligned pattern formation using wavelenghts | Armando C. Bottelli | 2004-07-20 |
| 6753247 | Method(s) facilitating formation of memory cell(s) and patterned conductive | Suzette K. Pangrle, Matthew S. Buynoski, Nicholas H. Tripsas, Mark S. Chang, Ramkumar Subramanian +1 more | 2004-06-22 |
| 6716571 | Selective photoresist hardening to facilitate lateral trimming | Calvin T. Gabriel, Harry J. Levinson | 2004-04-06 |
| 6653231 | Process for reducing the critical dimensions of integrated circuit device features | Chih-Yuh Yang, Jeffrey A. Shields | 2003-11-25 |
| 6630288 | Process for forming sub-lithographic photoresist features by modification of the photoresist surface | Jeffrey A. Shields, Chih-Yuh Yang | 2003-10-07 |
| 6589709 | Process for preventing deformation of patterned photoresist features | Jeffrey A. Shields, Chih-Yuh Yang | 2003-07-08 |
| 6589713 | Process for reducing the pitch of contact holes, vias, and trench structures in integrated circuits | — | 2003-07-08 |
| 6518175 | Process for reducing critical dimensions of contact holes, vias, and trench structures in integrated circuits | — | 2003-02-11 |
| 6475904 | Interconnect structure with silicon containing alicyclic polymers and low-k dielectric materials and method of making same with single and dual damascene techniques | Ramkumar Subramanian | 2002-11-05 |
| 6127089 | Interconnect structure with low k dielectric materials and method of making the same with single and dual damascene techniques | Ramkumar Subramanian, Christopher F. Lyons | 2000-10-03 |
| 6103445 | Photoresist compositions comprising norbornene derivative polymers with acid labile groups | C. Grant Willson, David Medieros | 2000-08-15 |