Issued Patents All Time
Showing 76–88 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7500397 | Activated chemical process for enhancing material properties of dielectric films | Scott J. Weigel, Raymond Nicholas Vrtis, Dino Sinatore | 2009-03-10 |
| 7470454 | Non-thermal process for forming porous low dielectric constant films | Aaron Scott Lukas, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Eugene Joseph Karwacki, Jr. | 2008-12-30 |
| 7468290 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | Aaron Scott Lukas, Jean Louise Vincent, Raymond Nicholas Vrtis, Mark Daniel Bitner, Eugene Joseph Karwacki, Jr. | 2008-12-23 |
| 7404990 | Non-thermal process for forming porous low dielectric constant films | Aaron Scott Lukas, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Eugene Joseph Karwacki, Jr. | 2008-07-29 |
| 7384471 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao, John Anthony Thomas Norman | 2008-06-10 |
| 7332445 | Porous low dielectric constant compositions and methods for making and using same | Aaron Scott Lukas, Eugene Joseph Karwacki, Jr., Raymond Nicholas Vrtis, Jean Louise Vincent | 2008-02-19 |
| 7098149 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | Aaron Scott Lukas, Jean Louise Vincent, Raymond Nicholas Vrtis, Mark Daniel Bitner, Eugene Joseph Karwacki, Jr. | 2006-08-29 |
| 7074489 | Low dielectric constant material and method of processing by CVD | Aaron Scott Lukas, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Brian K. Peterson | 2006-07-11 |
| 6846515 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao, John Anthony Thomas Norman | 2005-01-25 |
| 6716770 | Low dielectric constant material and method of processing by CVD | Brian K. Peterson, Jean Louise Vincent, Raymond Nicholas Vrtis | 2004-04-06 |
| 6583048 | Organosilicon precursors for interlayer dielectric films with low dielectric constants | Jean Louise Vincent, Howard Paul Withers, Jr., Scott Edward Beck, Raymond Nicholas Vrtis | 2003-06-24 |
| 6187248 | Nanoporous polymer films for extreme low and interlayer dielectrics | Lloyd M. Robeson, William F. Burgoyne, Jr., Michael Langsam | 2001-02-13 |
| 5733964 | Surfactants for heterogeneous processes in liquid or supercritical CO.sub.2 | Keith P. Johnston, Steven P. Wilkinson, Lloyd M. Robeson, Simon Mawson, Richard Henry Bott +1 more | 1998-03-31 |