| 12505986 |
Synchronization of plasma processing components |
Gideon Van Zyl, Kevin Fairbairn |
2025-12-23 |
|
| 12176184 |
Synchronization of bias supplies |
Gideon Van Zyl, Kevin Fairbairn |
2024-12-24 |
$28,432,000 |
| 12159767 |
Spatial control of plasma processing environments |
Daniel Carter, Kevin Fairbairn, Victor Brouk |
2024-12-03 |
$8,973,000 |
| 12142460 |
Control of plasma sheath with bias supplies |
Kevin Fairbairn, Daniel Carter |
2024-11-12 |
$13,619,000 |
| 12009181 |
Match efficiency-variation compensation |
Holger Philipp Kley, Suryan Emani |
2024-06-11 |
$13,302,000 |
| 11842884 |
Spatial monitoring and control of plasma processing environments |
Kevin Fairbairn, Daniel Carter |
2023-12-12 |
$29,395,000 |
| 11610761 |
Synchronization between an excitation source and a substrate bias supply |
Kevin Fairbairn, Daniel Carter |
2023-03-21 |
$11,562,000 |
| 11437221 |
Spatial monitoring and control of plasma processing environments |
Daniel Carter, Kevin Fairbairn, Victor Brouk |
2022-09-06 |
$22,224,000 |
| 11282677 |
Spatial monitoring and control of plasma processing environments |
Kevin Fairbairn, Daniel Carter |
2022-03-22 |
$14,261,000 |
| 11264209 |
Application of modulating supplies in a plasma processing system |
Gideon Van Zyl, Kevin Fairbairn |
2022-03-01 |
$28,398,000 |
| 10896807 |
Synchronization between an excitation source and a substrate bias supply |
Kevin Fairbairn, Daniel Carter |
2021-01-19 |
$51,671,000 |
| 10811227 |
Application of modulating supplies in a plasma processing system |
Gideon Van Zyl, Kevin Fairbairn |
2020-10-20 |
$10,537,000 |
| 10811228 |
Control of plasma processing systems that include plasma modulating supplies |
Gideon Van Zyl, Kevin Fairbairn |
2020-10-20 |
$10,537,000 |
| 10811229 |
Synchronization with a bias supply in a plasma processing system |
Gideon Van Zyl, Kevin Fairbairn |
2020-10-20 |
$10,537,000 |
| 10707055 |
Spatial and temporal control of ion bias voltage for plasma processing |
Kevin Fairbairn, Daniel Carter |
2020-07-07 |
$30,041,000 |
| 10607813 |
Synchronized pulsing of plasma processing source and substrate bias |
Kevin Fairbairn, Daniel Carter |
2020-03-31 |
$18,500,000 |
| 10026595 |
Apparatus for frequency tuning in a RF generator |
Myeong Yeol Choi, Mike Mueller, Jeffrey Roberg, Steve Jordan |
2018-07-17 |
$17,781,000 |
| 9748076 |
Apparatus for frequency tuning in a RF generator |
Myeong Yeol Choi, Mike Mueller, Jeffrey Roberg, Steve Jordan |
2017-08-29 |
$17,752,000 |
| 7942112 |
Method and apparatus for preventing the formation of a plasma-inhibiting substance |
Fernando Gustavo Tomasel, Justin Mauck, Andrew Shabalin, Juan Jose Gonzalez |
2011-05-17 |
$7,032,000 |
| 6911789 |
Power supply for a hot-filament cathode |
Steven J. Geissler, James R. Kahn, Harold R. Kaufman |
2005-06-28 |
$3,024,000 |
| 6812648 |
Method of cleaning ion source, and corresponding apparatus/system |
Henry Luten, Vijayen S. Veerasamy, Maximo Frati |
2004-11-02 |
$4,343,000 |