Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8088440 | Hydrophobic coating including underlayer(s) deposited via flame pyrolysis | — | 2012-01-03 |
| 7261768 | Hydrophobic coatings and methods | John Bohland | 2007-08-28 |
| 7183559 | Ion source with substantially planar design | Vijayen S. Veerasamy | 2007-02-27 |
| 7138186 | Hydrophobic coatings and methods | — | 2006-11-21 |
| 7049003 | Method of manufacturing windshield using ion beam milling of glass substrate(s) | Scott V. Thomsen, Rudolph Hugo Petrmichl, Anthony V. Longobardo, Vijayen S. Veerasamy, David R. Hall | 2006-05-23 |
| 6986955 | Electronic and optical materials | Jerome J. Schmitt, George Guang-Ji Cui, Fang Yang, Fe Alma Gladden, Scott Flanagan +2 more | 2006-01-17 |
| 6815690 | Ion beam source with coated electrode(s) | Vijayen S. Veerasamy, Rudolph Hugo Petrmichl | 2004-11-09 |
| 6812648 | Method of cleaning ion source, and corresponding apparatus/system | Vijayen S. Veerasamy, Maximo Frati, Denis Shaw | 2004-11-02 |
| 6808606 | Method of manufacturing window using ion beam milling of glass substrate(s) | Scott V. Thomsen, Rudolph Hugo Petrmichl, Vijayen S. Veerasamy, Anthony V. Longobardo, David R. Hall | 2004-10-26 |
| 6740211 | Method of manufacturing windshield using ion beam milling of glass substrate(s) | Scott V. Thomsen, Rudolph Hugo Petrmichl, Anthony V. Longobardo, Vijayen S. Veerasamy, David R. Hall | 2004-05-25 |
| 6372364 | Nanostructure coatings | Andrew Tye Hunt | 2002-04-16 |
| 6368665 | Apparatus and process for controlled atmosphere chemical vapor deposition | Andrew Tye Hunt, Subramaniam Shanmugham, William Danielson, Tzyy Jiuan Hwang, Girish Nilkanth Deshpande | 2002-04-09 |
| 6265597 | Dopants for semiconducting materials | William S. Rees, Jr. | 2001-07-24 |
| 6193911 | Precursor solution compositions for electronic devices using CCVD | Andrew Tye Hunt, Tzyy Jiuan Hwang, Helmut G. Hornis, Hong Shao, Joe Thomas +3 more | 2001-02-27 |
| 6156917 | Dopants for semiconducting materials | William S. Rees, Jr. | 2000-12-05 |