Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Spatial monitoring and control of plasma processing environments

Spatial monitoring and control of plasma processing environments

US Patent 11437221 · Granted Sep 6, 2022

Estimated economic value: $22,224,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus to produce a waveform2025
Apparatus to produce a waveform2025
Synchronization of plasma processing components2025
Synchronization of plasma processing components2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
Apparatus to control ion energy2025
Synchronization of bias supplies2024
Synchronization of bias supplies2024
Spatial control of plasma processing environments2024
Spatial control of plasma processing environments2024
Spatial control of plasma processing environments2024