Issued Patents 2025
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417902 | Method for cleaning a chamber | Ran Lin, Wenbing Yang, Tamal Mukherjee, Jengyi Yu, Yang Pan +1 more | 2025-09-16 |
| 12417916 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2025-09-16 |
| 12400842 | Method of cleaning chamber components with metal etch residues | Wenbing Yang, Ran Lin, Tamal Mukherjee, Chunhong Zhou, Xiaoyu Kang +2 more | 2025-08-26 |
| 12341021 | Selective etch using deposition of a metalloid or metal containing hardmask | Daniel Peter, Arunima Deya BALAN, Younghee Lee, Yang Pan | 2025-06-24 |
| 12278125 | Integrated dry processes for patterning radiation photoresist patterning | Jengyi Yu, Mohammed Haroon Alvi, Richard Wise, Yang Pan, Richard A. Gottscho +5 more | 2025-04-15 |
| 12266542 | Atomic layer etching for subtractive metal etch | Wenbing Yang, Mohand Brouri, Shih-Ked Lee, Yiwen FAN, Wook Choi +3 more | 2025-04-01 |
| 12256645 | Chemical etch nonvolatile materials for MRAM patterning | Wenbing Yang, Tamal Mukherjee, Zhongwei Zhu, Ran Lin, Yang Pan +2 more | 2025-03-18 |
| 12249514 | Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers | Jon Henri, Karthik S. Colinjivadi, Francis Sloan Roberts, Kapu Sirish Reddy, Shih-Ked Lee +4 more | 2025-03-11 |
| 12211691 | Dry development of resists | Boris Volosskiy, Timothy Weidman, Chenghao Wu, Kevin Li Gu | 2025-01-28 |
| 12191125 | Removing metal contamination from surfaces of a processing chamber | Jengyi Yu, Seongjun Heo, Ge Yuan, Siva Kanakasabapathy | 2025-01-07 |