Issued Patents 2025
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12300473 | Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber | Shahid Rauf, Peng Tian | 2025-05-13 |
| 12272575 | Advanced temperature control for wafer carrier in plasma processing chamber | Fernando Silveira, Chunlei Zhang, Phillip Criminale | 2025-04-08 |
| 12198966 | Substrate support with multiple embedded electrodes | Philip Allan Kraus, Thai Cheng Chua | 2025-01-14 |