Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12300473 | Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber | Jaeyong Cho, Peng Tian | 2025-05-13 |
| 12237149 | Reducing aspect ratio dependent etch with direct current bias pulsing | Deyang Li, Sunil Srinivasan, Yi-Chuan Chou, Kuan-Ting Liu, Jason A. Kenney +5 more | 2025-02-25 |