Issued Patents 2024
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12174541 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Masahiro Kanayama | 2024-12-24 |
| 12147160 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Daisuke KORI, Takayoshi NAKAHARA, Yuji Harada | 2024-11-19 |
| 12085857 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Masahiro Kanayama | 2024-09-10 |
| 12013640 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Takayoshi NAKAHARA, Takeru Watanabe, Daisuke KORI, Tsutomu Ogihara | 2024-06-18 |
| 12001138 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Kai, Takeru Watanabe, Tsutomu Ogihara | 2024-06-04 |
| 11914295 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Masahiro Kanayama, Ryo MITSUI | 2024-02-27 |