Issued Patents 2024
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12174541 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Yusuke Biyajima | 2024-12-24 |
| 12085857 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Yusuke Biyajima | 2024-09-10 |
| 11914295 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Ryo MITSUI | 2024-02-27 |