Issued Patents 2024
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12147160 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Takayoshi NAKAHARA, Yusuke Biyajima, Yuji Harada | 2024-11-19 |
| 12105420 | Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer | Keisuke NIIDA, Yasuyuki Yamamoto, Takayoshi NAKAHARA, Tsutomu Ogihara | 2024-10-01 |
| 12032293 | Composition for forming organic film, patterning process, and polymer | Takayoshi NAKAHARA, Yasuyuki Yamamoto, Hironori Satoh, Tsutomu Ogihara | 2024-07-09 |
| 12013640 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Takayoshi NAKAHARA, Takeru Watanabe, Yusuke Biyajima, Tsutomu Ogihara | 2024-06-18 |
| 11934100 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Kai, Kazunori Maeda | 2024-03-19 |
| 11886118 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Takashi SAWAMURA, Keisuke NIIDA, Seiichiro Tachibana | 2024-01-30 |