Issued Patents 2024
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12032287 | Resist material and patterning process | Tomohiro Kobayashi, Tsukasa Watanabe, Hiroki Nonaka | 2024-07-09 |
| 11994798 | Resist material and patterning process | Tomohiro Kobayashi, Tsukasa Watanabe, Hiroki Nonaka | 2024-05-28 |
| 11886118 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Takashi SAWAMURA, Keisuke NIIDA | 2024-01-30 |